Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/10226
標題: 以多靶磁控濺鍍法在聚碳酸酯基板上製備高穿透氧化銦錫導電膜之研究
Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
作者: Li, Shui-Wen
李水文
關鍵字: ITO
氧化銦錫
Antireflection coating
Polycarbonate substrate
Transmittance
抗反射鍍膜
聚碳酸脂
穿透率
出版社: 材料科學與工程學系所
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摘要: 本研究係使用多靶材設計及直流附加射頻電源的磁控濺鍍機,在聚碳酸脂基板上製鍍抗反射層(SiO2及TiO2)及氧化銦錫導電膜(ITO),以取代觸控面板結構中的導電玻璃。首先將單層薄膜分別鍍製於矽基板上,以橢圓偏光儀量測各層薄膜之折射率、反射率以及吸收率等,提供光學模擬軟體使用;光學薄膜製鍍前使用氧電漿進行聚碳酸脂基板表面處理,再依照優化後的濺鍍功率、溫度、製程壓力等參數進行薄膜沉積,最後探討各層薄膜的電阻率、穿透率、微結構以及薄膜附著力等特性。 本研究所使用的聚碳酸脂高分子聚合物基板,其溫度耐受性為100~130 ℃,價格便宜且重量輕,適合取代一般的玻璃基板;而具有高光穿透率以及高導電性的ITO薄膜沉積在聚碳酸脂基板上,在觸控面板的應用將有很大的潛力。本實驗使用多靶材設計及直流附加射頻電源的磁控濺鍍機,製鍍ITO薄膜以及抗反射層薄膜,經由濺鍍參數調整後,在室溫下射頻濺鍍功率、氬氣流量以及氧氣流量分別為1.6 KW、300 sccm以及2.2 sccm時,所沉積的ITO薄膜(20 nm)的片電阻為300-600 Ω/□,且可見光穿透率達88 %;將優化後的抗反射層與ITO薄膜連續沉積於同一個聚碳酸脂基板上,整體的可見光穿透率可提升至91 %;本研究成功的在同一個聚碳酸脂基板上鍍製透明導電膜以及抗反射膜結構,可以節省觸控面板外部的保護玻璃,以及保護玻璃與觸控面板黏著接合的光學膠等材料成本,在觸控面板的應用價值極高。
In this study, the multi-target and dual-power (DC & RF) magnetron sputtering system was adopted to deposit anti-reflective films (SiO2 and TiO2) and transparent conducting film (indium-tin oxide, ITO) on polycarbonate substrates for touch plane applications. Before simulating the optical performance of this functional coating, the single-layer material such as SiO2, TiO2 and ITO was deposited on the Si substrates to acquire the corresponding reflectivity, absorptivity and refractive index data using an ellipseometer. The polycarbonate substrates were cleaned using O2 plasma before each coating process. The optical multilayer coatings were deposited with various process parameters such as sputtering power, substrate temperature and working pressure. The resistivity, transmittance, microstructure and mechanical characteristics of optical thin films were measured to evaluate the performance.In this work, the macromolecule polymer substrate (polycarbonate) with an endurance temperature of 100-130℃was used to replace the conventional glass substrate due to its lower cost. Since the ITO thin film has high transmittance (in the visible region) and low resistivity, the ITO thin film deposited on PC substrate can act as a potential structure for touch plane applications. Under optimum deposition conditions, where the working temperature, RF power, Ar and O2 flow rates were controlled on room temperature, 1.6 KW, 300 sccm and 2.2 sccm, respectively, the 20 nm ITO thin film with sheet resistivity of 300-600 Ω/□ and visible light transmittance of 88% was achieved. The successive ITO and anti-reflective coating process within the same multi-target and sputtering system, the transmittance of this functional coating can be improved to 91%. By integrating the cover glass, cover lens and adhesion glue, the developed functional multilayer (ITO with antireflection) shows high potential in touch panel applications.
URI: http://hdl.handle.net/11455/10226
其他識別: U0005-2001201207520700
文章連結: http://www.airitilibrary.com/Publication/alDetailedMesh1?DocID=U0005-2001201207520700
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