Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/10374
標題: Effects of different process parameters on the properties of carbon films prepared by thermal chemical vapor deposition using propane and nitrogen
不同製程參數對以丙烷/氮氣製備熱化學氣相沉積碳薄膜性質之影響
作者: Chiou, Shao-En
邱紹恩
關鍵字: propane
丙烷
thermal chemical vapor deposition
carbon films
熱化學氣相沉積
碳薄膜
出版社: 材料科學與工程學系所
引用: 參考文獻 [1] R.J. King, Geology Today, 22 (2006) 71 [2] A. Deneuville, Comptes Rendus de l''Académie des Sciences - Series IV - Physics-Astrophysics, 1 (2000) 81. [3] E. Kohn, M. Adamschik, P. Schmid, A. Denisenko, A. Aleksov, and W. Ebert, Journal of Physics D: Applied Physics, 34 (2001) R77. [4] R.S. Balmer, J.R. Brandon, S.L. Clewes, H.K. Dhillon, J.M. Dodson, I. Friel, P.N. Inglis, T.D. Madgwick, M.L. Markham, T.P. Mollart, N. Perkins, G.A. Scarsbrook, D.J. Twitchen, A.J. Whitehead, J.J. Wilman, and S. M. Woollard, Journal of Physics: Condensed Matter, 21 (2009) 364221. [5] H.W. Kroto, J.R. Heath, S.C. O''Brien, R.F. Curl, and R.E. Smalley, Nature, 318 (1985) 162. [6] V.S. Muralidharan and A. Subramania, “Nanoscience and Technology,” Ane Books Pvt. Ltd., New Delhi, India (2009). [7] H. Zhu, J. Wei, K. Wang, and D. Wu, Solar Energy Materials and Solar Cells, 93 (2009) 1461. [8] R.C. Haddon, A.F. Hebard, M.J. Rosseinsky, D.W. Murphy, S.J. Duclos, K.B. Lyons, B. Miller, J.M. Rosamilia, R.M. Fleming, A.R. Kortan, S.H. Glarum, A.V. Makhija, A.J. Muller, R.H. Eick, S.M. Zahurak, R. Tycko, G. Dabbagh, and F.A. Thiel, Nature, 350 (1991) 320. [9] K.S. Novoselov, A. K. Geim, S.V. Morozov, D. Jiang, Y. Zhang, S.V. Dubonos, I.V. Grigorieva, and A.A. Firsov, Science, 306 (2004) 666. [10] A.K. Geim and K.S. Novoselov, Nature Materials, 6 (2007) 183. [11] J.C. Meyer, A.K. Geim, M.I. Katsnelson, K.S. Novoselov, T.J. Booth, and S. Roth, Nature, 446 (2007) 60. [12] J.H. Chen, C. Jang, S. Xiao, M. Ishigami, and M.S. Fuhrer, Nature Nanotechnology, 3 (2008) 206. [13] A. K. Geim, Science, 324 (2009) 1530. [14] R.R. Nair, P. Blake, A.N. Grigorenko, K.S. Novoselov, T.J. Booth, T. Stauber, N.M.R. Peres, and A.K. Geim, Science, 6 (2008) 1308. [15] K.S. Kim, Y. Zhao, H. Jang, S.Y. Lee, J.M. Kim, K.S. Kim, J.H. Ahn, P. Kim, J.Y. Choi, and B.H. Hong, Nature, 457 (2009) 706. [16] F. Schedin, A.K. Geim, S.V. Morozov, E.W. Hill, P. Blake, M.I. Katsnelson, and K.S. Novoselov, Nature Materials, 6 (2007) 652. [17] K.S. Novoselov, A. K. Geim, S.V. Morozov, D. Jiang, Y. Zhang, S.V. Dubonos, I.V. Grigorieva, and A.A. Firsov, Science, 306 (2004) 666. [18] S. Iijima, Nature, 354 (1991) 56. [19] R.L. McCreery, Chemical Reviews, 108 (2008) 2646. [20] V.S. Muralidharan and A. Subramania, “Nanoscience and Technology,” Ane Books Pvt. Ltd., New Delhi, India (2009). [21] R.W. Dayton, J.H. Oxley, and C.W. Townley, Journal of Nuclear Materials, 11 (1964) 1. [22] O.M.S. Filipe and C.M.A. Brett, Electroanalysis, 16 (2004) 994. [23] M. Hadi, A. Rouhollahi, M. Yousefi, F. Taidy, and R. Malekfar, Electroanalysis, 18 (2006) 787. [24] A.P. Graham, K. Richter, T. Jay, W. Weber, S. Knebel, U. Schröder, and T. Mikolajick, Journal of Applied Physics, 108 (2010) 104508. [25] G.P. Keeley, N. McEvoy, S. Kumar, N. Peltekis, M. Mausser, and G.S. Duesberg, Electrochemistry Communications, 12 (2010) 1034. [26] K.M. Krishna, Y. Nukaya, T. Soga, T. Jimbo, and M. Umeno, Solar Energy Materials and Solar Cells, 65 (2001) 163. [27] R.N. Basu, O. Altin, M.J. Mayo, C.A. Randall, and S. Eser, Journal of The Electrochemical Society, 148 (2001) A506. [28] H. Mohammadia and K. Mequanint, Medical Engineering & Physics, 33 (2011) 131. [29] A. Kluba, D. Bociaga, and M. Dudek, Diamond and Related Materials, 19 (2010) 533. [30] M. Umeno and S. Adhikary, Diamond and Related Materials, 14 (2005) 1973. [31] X.M. Tiana, M. Rusop, Y. Hayashi, T. Soga, T. Jimbo, and M. Umeno, Solar Energy Materials and Solar Cells, 77 (2003) 105. [32] A. Czyzniewski, Surface & Coatings Technology, 203 (2009) 1027. [33] K.M. Krishna, M. Umeno, Y. Nukaya, T. Soga, and T. Jimbo, Applied Physics Letters, 77 (2000) 1472. [34] http://en.wikipedia.org/wiki/Allotropes_of_carbon [35] http://zh.wikipedia.org/wiki/File:Graphen.jpg [36] M.J. Jackson, “Microfabrication and Nanomanufacturing,” CRC Press, Florida, U.S.A. (2006). [37] P. Delhaes, Carbon, 40 (2002) 641. [38] D.S. Rickerby and A. Matthews, “Advanced Surface Coatings: a handbook of Surface Engineering,” Blackie and Son Ltd., London, U.K. (1991) [39] A. Pfrang, Y.Z. Wan, and T. Schimmel, Carbon, 48 (2010) 921. [40] S.T. Shiue, P.Y. Chen, R.H. Lee, T.S. Chen, and H.Y. Lin, Surface & Coatings Technology, 205 (2010) 780. [41] P.Y. Chen, “Effect of nitrogen/methane ratios and substrate sizes on the properties of carbon coatings on optical fibers prepared by thermal chemical vapor deposition,” Master thesis, Department of Materials Science and Engineering, National Chung Hsing University, Taichung City, Taiwan (R.O.C.) (2008). [42] L.H. Lai, K.J. Huang, S.T. Shiue, J.T. Chang, and J.L. He, J. Electrochem. Soc., 159 (2012) D367. [43] R.H. Lee, “Hermetically carbon-coated optical fibers prepared by thermal chemical vapor deposition: effects of different acetylene/nitrogen ratios, temperatures, pressures, and flow rates on the properties of carbon coatings,” Master thesis, Department of Materials Science and Engineering, National Chung Hsing University, Taichung City, Taiwan (R.O.C.) (2009). [44] J. Robertson, Materials Science and Engineering: R, 37 (2002) 129. [45] Propane Gas Association of Canada, Propane & The Environment, info@propanegas.ca [46] B.D. Cullity and S.R. Stock, “Elements of X-ray Diffraction,” 3rd Ed., Prentice Hall, New Jersey, U.S.A. (2001). [47] R.L. Mccreery, “Raman Spectroscopy for Chemical Analysis,” John Wiley and Sons, New York, U.S.A. (2000). [48] A.C. Ferrari and J. Robertson, Physical Review B, 61 (2000) 14095. [49] F. Tuinsta, and J.L. Koenig, The Journal of Chemical Physical, 53 (1970) 1126. [50] P.C. Eklund, J.M. Holden, and R.A. Jishi, Carbon, 33 (1995) 959. [51] 汪建民主編,「材料分析」,中國材料科學學會 (2008)。 [52] J.F. Moulder, W.F. Stickle, P.E. Sobol, J. Chastain, and K.D. Bomben, “Handbook of X-ray Photoelectron Spectroscopy,” Perkin-Elmer Corporation, Minnesota, U.S.A. (1992). [53] T. Young, Philosophical Transactions of the Royal Society of London, 95 (1805) 65. [54] Instruction manual of the Four-point Probe (Model: QT-50). [55] Y.S. Ding, W.N. Li, S. Iaconetti, X.F. Shen, J. DiCarlo, F.S. Galasso, and S.L. Suib, Surface & Coatings Technology, 200 (2006) 3041. [56] T. Jawhari, A. Roid, and J. Casado, Carbon, 33 (1995) 1561. [57] A. Sadezky, H. Muckenhuber, H. Grothe, R. Niessner, and U. Pöschl, Carbon, 43 (2005) 1731. [58] J.M. Vallerot, X. Bourrat, A. Mouchon, and G. Chollon, Carbon, 44 (2006) 1833. [59] S. Potgieter-Vermaak, N. Maledi, N. Wagner, J.H.P. Van Heerden, R. Van Grieken, and J.H. Potgieter, Journal of Raman Spectroscopy, 42 (2011) 123. [60] A.C. Ferrari and J. Robertson, Physical Review B, 63 (2001) 121405. [61] L.G. Cancado, K. Takai, T. Enoki, M. Endo, Y.A. Kim, H. Mizusaki, A. Jorio, L.N. Coelho, R. Magalhães-paniago, and M.A. Pimenta, Applied Physics Letters, 88 (2006) 163106. [62] E. Tomasella, C. Meunier, and S. Mikhailov, Surface & Coatings Technology, 141 (2001) 286. [63] M. Lejeune, O.D. Drouhin, J. Henocque, R. Bouzerar, A. Zeinert, and M. Benlahsen, Thin Solid Films, 389 (2001) 233. [64] G.L. Dû, N. Celini, F. Bergaya, and F. Poncin-epaillard, Surface & Coatings Technology, 201 (2007) 5815. [65] N. Inagaki, K. Narushima, H. Hashimoto, and K. Tamura, Carbon, 45 (2007) 797. [66] P. Mérel, M. Tabbal, M. Chaker, S. Moisa, and J. Margot, Applied Surface Science, 136 (1998) 105. [67] H.S. Zhang, K. Komvopoulos, Journal of Applied Physics, 106 (2009) 093504. [68] R.N. Wenzel, The Journal of Physical Chemistry, 53 (1949) 1466. [69] L. Ostrovskaya, V. Perevertailo, V. Ralchenko, A. Dementjev, and O. Loginova, Diamond and Related Materials, 11 (2002) 845. [70] T.H. Fang and W.J. Chang, Applied Surface Science, 220 (2003) 175. [71] J.H. Son, M.Y. Park, and S.W. Rhee, Thin Solid Films, 335 (1998) 229. [72] L.S. Kershenbaum and J. Martin, Kinetics of the Nonisothermal Pyrolysis of Propane, 13 (1967) 148. [73] M. Ohring, Materials Science of Thin Films, 2nd Ed., Academic Press, San Diego, U.S.A. (2002).
摘要: 本篇論文主要是以熱化學氣相沉積法製備碳薄膜,並探討不同丙烷/氮氣比例對碳薄膜性質之影響;也探討不同製程參數包含氣體總流量、沉積溫度及工作壓力對沉積速率之影響。利用場發射掃描式電子顯微鏡、X光繞射儀、拉曼散射光譜儀、X光光電子能譜儀、原子力顯微鏡、接觸角量測儀、四點探針儀和殘留氣體分析儀來量測並分析碳薄膜的沉積厚度、微觀結構、表面特性、電學性質及製程殘餘氣體。研究結果發現,碳薄膜主要是由丙烷之外的C3物種 (other C3)、CH3、CH4、C2H2及C2H3共同沉積而成,其反應級數為一次方。隨著丙烷含量比例、工作壓力的增加,碳薄膜的沉積速率會上升,沉積速率與丙烷含量比例、丙烷分壓皆為一次方關係。表面粗糙度與電阻率會隨著丙烷含量比例的增加而上升;而結構的有序程度、平均晶粒大小 (La和Lc)、碳碳雙鍵 (sp2 C=C) 的含量和水接觸角會隨著丙烷含量比例的增加而下降。隨著沉積溫度的增加,碳薄膜的沉積速率會上升,並推算出反應之活化能為233.7 kJ/mol;當氣體總流量增加時,丙烷在沉積區的停留時間減少,使得碳薄膜的沉積速率下降,沉積速率與停留時間約為一次方關係。
This study investigates the effects of different propane/nitrogen ratio on the properties of carbon films prepared by thermal chemical vapor deposition. We also investigate the effects of different mass flow rate, deposition temperature and working pressure on the deposition rate of carbon films. The thickness, microstructure, surface property, electrical property of carbon films and residual gas of process were investigated by field emission scanning electron microscopy, X-ray diffraction spectrometer, Raman scattering spectrometer, X-ray photoelectron spectrometer, atomic force microscopy, contact angle meter, four-points probe, and residual gas analyzer. The results indicate that the carbon films are deposited with CH3, CH4, C2H2, C2H3 and other C3, the process is a first-order reaction. The deposition rate increases with increasing the C3H8/(C3H8+N2) ratio, deposition temperature and partial pressure of propane but decreases with increasing mass flow rate. The activation energy is 233.7 kJ/mol. The deposition rate is proportional to about first-order of the C3H8/(C3H8+N2) ratio, resident time of propane in deposition zone, and partial pressure of propane. The surface roughness and electrical resistivity increase with increasing the C3H8/(C3H8+N2) ratio, but the degree of order, size of mean crystallite (La and Lc), content of sp2 bonding and water contact angle decrease.
URI: http://hdl.handle.net/11455/10374
其他識別: U0005-2706201217560000
文章連結: http://www.airitilibrary.com/Publication/alDetailedMesh1?DocID=U0005-2706201217560000
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