Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/11511
標題: 鎳鐵/氧化鎳奈米雙層薄膜濺鍍於Antidot基板之結構及磁性質研究
The Structures and Magnetic Properties of NiFe/NiO Bilayers deposited on Antidot substrate
作者: 高健發
Gao, Jian-Fa
關鍵字: 交換偏壓,矯頑磁力,圖案化基板
exchange bias,coercivity,antidot
出版社: 材料科學與工程學系所
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摘要: 本研究利用雙離子束濺鍍系統製備鎳鐵/氧化鎳[Ni80Fe20/Ni-oxide(16%O2/Ar)]雙層薄膜,主要可分為兩部分,(i)探討鎳鐵單層薄膜之微結構及磁性質分析;(ii)探討鎳鐵/氧化鎳雙層薄膜之微結構及磁性質分析;首先本實驗將鎳鐵單層薄膜及鎳鐵/氧化鎳雙層薄膜分別製備於SiO2基板上,並且藉由使用Antidot基板探討薄膜製備之磁性質差異性。而雙層膜鍍膜時先以End-Hall 離子源輔鍍上氧化鎳薄膜,後鍍上鎳鐵薄膜,期望使用Antidot基板造成磁異向性,並探討對磁性質造成之影響。 鎳鐵單層薄膜:X光繞射結果顯示,鎳鐵單層膜(16nm)鍍在antidot基板之結構與鍍在連續膜者相似,均為FCC結構,晶格常數約為3.54 A。原子力/磁力顯微鏡研究顯示:圖案化鎳鐵之rRMS~0.39 nm,而磁區分佈以孔洞狀規律排列。磁性質研究顯示:室溫之圖案化鎳鐵其矯頑磁力約為2 Oe,與鎳鐵連續膜相同,但具有不同之磁滯曲線,主要由於圖案化鎳鐵形成之缺陷改變了其形狀異向性。場冷(20 kOe)至低溫(T=5 K)磁性質研究顯示:圖案化鎳鐵單層膜之矯頑磁力約為42 Oe較連續膜者(34 Oe)大,主要由於圖案化基板具較大之形狀異向性,但均呈對稱之磁滯曲線,且無明顯之交換偏壓場(+/- 2 Oe)。 鎳鐵/氧化鎳雙層薄膜:X光繞射結果顯示,圖案化鎳鐵/氧化鎳與連續膜鎳鐵/氧化鎳具有相同之結構(氧化鎳a=4.23 A)。原子力/磁力顯微鏡研究顯示: 圖案化鎳鐵/氧化鎳之rRMS~0.87 nm較連續膜鎳鐵/氧化鎳者(rRMS~0.27 nm)為高,而磁區分佈亦以孔洞狀規律排列。磁性質研究顯示:室溫之圖案化鎳鐵/氧化鎳期矯頑磁力約為40 Oe,較連續膜鎳鐵/氧化鎳者(Hc~30 Oe)為高,此磁滯曲線增加為交換偏壓之特性之一。場冷(20 kOe)至低溫(T=5 K)磁性質研究顯示:圖案化之鎳鐵/氧化鎳之矯頑磁力約為160 Oe,較連續膜鎳鐵/氧化鎳者(Hc~110 Oe)為高,且圖案化鎳鐵/氧化鎳之交換偏壓場(Hex~ -80 Oe)同樣較連續膜鎳鐵/氧化鎳者(Hex~ -20 Oe)為高,且磁滯曲線均不對稱,此因界面間磁區生成或界面間磁矩的錯位或重新排列所致。
This study uses a dual ion beam sputtering system prepare samples of Ni80Fe20/Ni- oxide (16% O2/Ar) bilayer films, it can be divided into two parts, (i) to explore the microstructure and magnetic properties of NiFe single layer; (ii) o to explore the microstructure and magnetic properties of NiFe/NiO bilayer; We expect that by use Antidot substrate cause the magnetic anisotropy, and to explore the impact caused by the magnetic properties. NiFe single layer film: X-ray diffraction results show that the NiFe single layer film was plated in antidot substrates and SiO2 are both FCC structure, the lattice constant are about 3.54 A. Atomic force / magnetic force microscopy studies have shown that: the rRMS of patterned NiFe ~ 0.39 nm. The magnetic properties: The coercivity of patterned NiFe is about 2 Oe same with of the NiFe continuous film at room temperature, but it can observe the different shape of hysteresis curve mainly caused by the defects formed by the isotropic of pattern NiFe. Cold field (20 kOe) to low temperature (T = 5 K), the magnetic properties studies have shown that: The coercivity of pattern NiFe monolayer is about 42 Oe lager than continuous film 34 Oe, mainly caused by the patterned substrate with the shape anisotropy, but it can observe the symmetry of the hysteresis curve, and no obvious exchange bias field (+ / - 2 Oe). NiFe /NiO bilayer films: X-ray diffraction results show that the patterned NiFe/NiO and NiFe/NiO continuous film has the same structure. The atomic force / magnetic force microscopy studies have shown that: The rRMS of patterned NiFe/NiO is ~ 0.87 nm, the rRMS of continuous film of NiFe/NiO is 0.27 nm. The magnetic properties: The coercivity of patterned NiFe/NiO is about 40 Oe lager than the NiFe/NiO continuous film 30 Oe at room temperature. Cold field (20 kOe) to low temperature (T = 5 K) magnetic properties studies have shown that: The coercivity of patterned NiFe/NiO is about 160 Oe lager than the NiFe/NiO continuous film 110 Oe. And the exchange bias of pattern NiFe/NiO -80 Oe is also lager than the continuous NiFe/NiO -20 Oe, and hysteresis curves are not symmetry, The magnetic moment due to the generation of interface between sectors or the interface between dislocation or rearrangement.
URI: http://hdl.handle.net/11455/11511
其他識別: U0005-0207201205425600
文章連結: http://www.airitilibrary.com/Publication/alDetailedMesh1?DocID=U0005-0207201205425600
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