Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/1509
標題: 以二氧化矽鍍膜改善玻璃翹曲
Glass warpage study via silicon dioxide coating
作者: 馬禎妘
Ma, Chen Yun
關鍵字: silicon dioxide
二氧化矽
glass warpage
玻璃翹曲
出版社: 機械工程學系所
引用: [1] 光學科技工業協進會PIDA,2003 .11 48期 [2] 李正中,薄膜光學與鍍膜技術,第六版,藝軒出版社,台北市,2009年。 [3] H.A. Macleod, Thin Film Optical Filters, 2nd ed., McGraw Hill, New York, 1986. [4] G. V. Jorgenson and G. K. Wehner, “ Sputtering Studies of Insulators by means of Langmuir Probes”, J. Appl. Phys., 36, pp. 2672-2674, 1965. [5] J. L. Vossen, “Control of film properties by rf-sputtering techniques”, J. Vac. Sci Technol., 8, pp. 12-30, 1971. [6] Rung-Ywan Tsai, Chia Shy Chang, Cheng Wei Chu, Tzushin Chen, Fred Dai, Doris Lin, ShaoFeng Yan,and Albert Chang, “Thermally stable narrow-bandpass filter prepared by reactive ion-assisted sputtering”,Applied Optics, 40, pp. 1593-1598, 2001. [7] R. P. Howson, N. Danson, G. W. Hall, “ Reactive magnetron sputtering of silicon to produce silicon oxide”,Nuclear Instruments and Methods in Physics Research B, 121, pp. 90-95, 1997. [8] O. D. Vol’pyan and P. P. Yakovlev, Yu. A. Obod, “Investigation of SiO2 optical films produced by reactive ac magnetron sputtering”, J. Opt. Technol., 71, pp. 487-490, 2004. [9] F. Richter, H. Kupfer, P. Schlott, T. Gessner, C. Kaufmann, “Optical properties and mechanical stress in SiO2 / Nb2O5 multilayers”, Thin Solid Films, 389, pp. 278-283, 2001. [10] H. Seifarth, J.U. Schmidt, R. Grotzschel, M. Klimenkov, “Phenomenological model of reactive, r.f.-magnetron sputtering of Si in Ar/O2 atmosphere for the prediction of SiO x thin film stoichiometry from process parameters”, Thin Solid Films, 389, pp. 108-115, 2001. [11] A.F. Jankowski, J.P. Hayes, T.E. Felter, C. Evans, A.J. Nelson, “Sputter deposition of silicon–oxide coatings”, Thin Solid Films, 420 –421, pp. 43-46, 2002. [12] Le-Nian He, Jin Xu, “Properties of amorphous SiO2 films prepared by reactive RF magnetron sputtering method”, Vacuum, 68, pp. 197-202, 2003. [13] Hidehiko Yoda, Kazuo Shiraishi, Yuji Hiratani, and Osamu Hanaizumi, “a-Si:H/SiO2 multilayer films fabricated by radio-frequency magnetron sputtering for optical filters”, Applied Optics, 43, pp. 3548-3554,2004. [14] 玻璃表面處理技術 王承遇 陶瑛 編著,北京,2004年
摘要: 本研究主要是探討玻璃翹曲的原因與如何改善,確定為應力的不均造成此現象,進而利用不同的加工方式改善。 實驗結果比較三種不同的加工製程,對於光學特性與翹曲度及強度的影響,從結果得知,二氧化矽鍍膜實驗提升了穿透率,降低霧度,且不影響玻璃表面粗糙度,所以破壞性測試下,破裂強度與原本未加工的玻璃相近,表面應力與強化深度更優於其他加工法。 不論是以特性比較上來討論,或是比較製作工時與投資報酬率都具有量產性。
The purpose is to study the causes of glass warpage, which is found to be due to uneven internal stresses. There are processes that can help to improve. Experimental results from three different processes are compared in optical, warpage, and strength performances. Silicon dioxide coating increases transmittance, decreases haze, and does not have impacts on surface quality. Thus under destructive test, it is found that strength is close to that of unprocessed glass. CS and DOL is superior to other process methods. In comparing physical/chemical/optical characteristics, production cycle time, and beneficial result, it is more favorable in terms of mass production.
URI: http://hdl.handle.net/11455/1509
其他識別: U0005-0602201212245500
文章連結: http://www.airitilibrary.com/Publication/alDetailedMesh1?DocID=U0005-0602201212245500
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