Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/36626
標題: DNA as an electron-beam-sensitive reagent for nanopatterning
作者: 陳啟東
Lin, H.Y.
Tsai, L.C.
Chi, P.Y.
Chen, C.D.
關鍵字: surfaces
oligonucleotides
immobilization
lithography
monolayers
patterns
期刊/報告no:: Advanced Materials, Volume 18, Issue 12, Page(s) 1517-+.
摘要: Gold nanoparticle patterns (see figure) produced using a DNA molecular layer as an electron-beam-sensitive reagent are reported. The authors subjected thiolated single-strand DNA to a focused electron beam, resulting in the inhibition of hybridization to complementary strands, and then used gold nanoparticles to reveal nanoscale patterns. This technique has potential applications in the fabrication of DNA-based nanostructures.
URI: http://hdl.handle.net/11455/36626
ISSN: 0935-9648
文章連結: http://dx.doi.org/10.1002/adma.200502083
Appears in Collections:物理學系所

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