Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/36634
標題: Characteristics and interactions of threading dislocations in GaN films grown on (0001) sapphire substrates with or without short-period superlattice insertion
作者: 龔志榮
Wang, W.L.
Gong, J.R.
Wang, C.L.
Liao, W.T.
He, J.L.
Chi, Y.C.
Shi, J.B.
關鍵字: GaN
threading dislocations
defect analyses
chemical-vapor-deposition
optical-properties
phase epitaxy
layers
algan
relaxation
density
diodes
aln
期刊/報告no:: Japanese Journal of Applied Physics Part 1-Regular Papers Brief Communications & Review Papers, Volume 45, Issue 9A, Page(s) 6888-6892.
摘要: In this study, transmission electron microscopy was employed to investigate the characteristics of threading dislocations (TDs) in GaN films grown on the (0001) sapphire substrates with or without the insertion of Al0.3Ga0.7N (2 nm)/GaN (2 nm) short period superlattices (SPSLs). By using g (.) b = 0 invisibility criterion, it was found that most of the TDs were type a TDs in a GaN film either containing SPSL or having no SPSL insertion. Type a + c TDs were found to nucleate through the interactions between type a and type c TDs in GaN near the GaN/sapphire interface. Some of the type a TDs were observed to bend along GaN basal plane because of the influence of biaxial strain near the GaN/SPSL interface.
URI: http://hdl.handle.net/11455/36634
ISSN: 0021-4922
文章連結: http://dx.doi.org/10.1143/jjap.45.6888
Appears in Collections:物理學系所

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