Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/36708
標題: (Applied Surface Science,254(19):6177-6181)Exploring Width Effect on Performance Enhancement in NMOSFETs with Silicon-Carbon Alloy Stressor and Tensile Stress Silicon Nitride Linear
作者: Shu-Tong Chang
Wei Ching Wang
Jacky Huang
Shu-Hui Liao
Chung-Yi Lin
關鍵字: Silicon-carbon alloy
Stress
Mobility
MOSFET
出版社: Amsterdam,Netherlands:Elsevier Science Publishers B. V.
URI: http://hdl.handle.net/11455/36708
Appears in Collections:物理學系所

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