Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/39860
標題: High Ge Content of SiGe Channel pMOSFETs on Si (110) Surfaces
作者: Lee, M.H.
張書通
Chang, S.T.
Maikap, S.
Peng, C.Y.
Lee, C.H.
關鍵字: Mobility
orientation
SiGe
strain
(110)
inversion-layers
期刊/報告no:: Ieee Electron Device Letters, Volume 31, Issue 2, Page(s) 141-143.
摘要: The characteristics of Si(0.2)Ge(0.8) channel PFETs fabricated directly on Si (110) surfaces have been investigated. The saturation drain current and the hole mobility of a Si(0.2)Ge(0.8) (110) PFET are enhanced by 70% and by 80% for the < 110 > channel, as compared with that of a bulk Si (110) PFET. For comparison with a Si (100) PFET, a SiGe < 110 >/(110) PFET has similar to 200% hole mobility enhancement. The performance difference of the SiGe < 110 >/(110) and < 100 >/(110) PFET is about 2.7 times when considering mobility, and these effects are explained.
URI: http://hdl.handle.net/11455/39860
ISSN: 0741-3106
文章連結: http://dx.doi.org/10.1109/led.2009.2036138
Appears in Collections:光電工程研究所

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