Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/39863
標題: Effects of Applied Mechanical Uniaxial and Biaxial Tensile Strain on the Flatband Voltage of (001), (110), and (111) Metal-Oxide-Silicon Capacitors
作者: Peng, C.Y.
張書通
Yang, Y.J.
Fu, Y.C.
Huang, C.F.
Chang, S.T.
Liu, C.W.
關鍵字: Capacitor
deformation potential
flatband voltage
strained-Si
stress-free
threshold voltage
thin-films
poly-si
mosfet
mobility
stress
gate
semiconductors
s/d
ge
期刊/報告no:: Ieee Transactions on Electron Devices, Volume 56, Issue 8, Page(s) 1736-1745.
摘要: The flatband-voltage shift of metal-oxide-silicon capacitors is investigated under the application of low-level stress (up to 220 MPa of biaxial stress and 380 MPa of uniaxial stress) to different substrate orientations. We propose that the flatband-voltage shift be modeled as the net effect of silicon-band-edge shifts and modulation of the separation between the band edge and the Fermi level under low levels of applied mechanical strain. For the (001) n-type substrate, a negative flatband-voltage shift is observed due mainly to the downward shift of the conduction-band edge, while a positive flatband-voltage shift is observed for the (001) p-type substrate due to the upward shift of the valence-band edge. For the uniaxial tensile strain on n-substrate capacitors for (110) and (111) substrates, the modulation of band-edge and Fermi-level separation by the conduction-band density of states exceeds the downward shift of the conduction band, which induces a positive flatband shift that is distinct from that observed in the (001) n-substrate. The shift of the band edges is determined by the proposed model and compared with theoretical calculations.
URI: http://hdl.handle.net/11455/39863
ISSN: 0018-9383
文章連結: http://dx.doi.org/10.1109/ted.2009.2022693
Appears in Collections:光電工程研究所

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