Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/39980
標題: Ultra high-density silicon nanowires for extremely low reflection in visible regime
作者: Pei, T.H.
裴靜偉
Thiyagu, S.
Pei, Z.
關鍵字: optical-properties
solar-cells
surfaces
gratings
arrays
light
期刊/報告no:: Applied Physics Letters, Volume 99, Issue 15.
摘要: We fabricated large-area, vertically aligned silicon nanowire (SiNW) arrays on Si substrates employing catalytic etching on a polystyrene nanosphere template. The density of SiNWs was as high as 10(10)/cm(2), and the bottom radii of SiNWs ranged between 30 and 60 nm. The reflection from the SiNW layer was approximately 0.1% over the spectral range of 300-800nm for SiNWs longer than 750 am. Effective medium theory was applied to explain this extremely low reflection, and it was confirmed that the incident light scatters randomly inside cone-like SiNWs, which lengthens the actual traveling path of light. (C) 2011 American Institute of Physics. [doi10.1063/1.3650266]
URI: http://hdl.handle.net/11455/39980
ISSN: 0003-6951
文章連結: http://dx.doi.org/10.1063/1.3650266
Appears in Collections:光電工程研究所

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