Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/40028
標題: (Jpn. J. Appl. Phys.,42(12B):L1498-L1500)Rapid and Efficient Recrystallization and Activation of Implanted Phosphorus Doping in Laser-annealed Polysilicon vy Rapid Energy Transfer Annealing
作者: Yeu Long Jiang
Chi Lin Chen
Chiung Wei Lin
Shun Fa Huang
關鍵字: implanted dopant phosphorus atoms
laser-annealed polysilicon films
rapid energy transfer annealing
amorphous silicon films
polysilicon films
出版社: Japan:Japan Society of Applied Physics
URI: http://hdl.handle.net/11455/40028
ISSN: 1347-4065
Appears in Collections:光電工程研究所

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