Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/40038
標題: (Jpn. J. Appl. Phys. Part l,34(2B):927-931)Very Low Temperature Deposition of Polycrystalline Silicon Films Fabricated by Hydrogen Dilution With Electron Cyclotron Resonance Chemical Vapor Deposition
作者: K. C. Wang
K. L. Cheng
Y. L. Jiang
T. R. Yew
H. L. Hwang
關鍵字: hydrogen dilution
ECR-CVD
AFM
TEM
Raman spectra
crystalline fraction
X-ray diffraction pattern
出版社: Japan:Japan Society of Applied Physics
URI: http://hdl.handle.net/11455/40038
ISSN: 1347-4065
Appears in Collections:光電工程研究所

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