Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/4140
標題: 利用噴墨技術將墨水取代光罩製作微結構
FAST PATTERNING MICROSTRUCTURES USING INKJET PRINTING CONFORMAL MASKS
作者: 顏茂庭
Yen, Mau-Ting
關鍵字: microfabrication
微製造
inkjet
printing
lithography
conformal mask
噴墨微影
共型光罩
光阻
出版社: 精密工程學系所
引用: 1. 永續產業發產資訊網/歐盟危害物質限用指令。 2. 永續產業發產資訊網/廢電機電子設備指令簡介 3. 歐盟WEEE官方網站 4. Y. Cheng, B.-Y. Shew, C.-H. Lin, M. K. Chyu, “Concepts for creating ultra-deep trenches using deep x-ray lithography,” Sensors and Actuators, vol. 82, pp. 205-209, 2000 5. S. Lee, D. Kim, Y. Jin, Y. Han, Y. Desta, M. D. Bryant, J. Goettert, “A micro corona motor fabricated by a SU-8 built-on X-ray mask, ” Microsystem Technologies, vol. 10, 522-526, 2004 6. W. R. Cox, T. Chen, D. J. Hayes, “Micro-Optics fabrication by ink-jet printing,” Optics & Photonics News, 12(6) pp32-35, 2001 7. 陳釧鋒, 奈米轉印製程與設備技術發展現況介紹, 機械工程雜誌, 255期, 151-162, 2004. 8. Hui, C.Y., Jagota, A., Lin, Y.Y., Kramer, E. J.,” Constraints on Microcontact Printing Imposed by Stamp Deformation” Langmuir , 18, pp1394-1407 (2002) 9. Marc Klosner, Kanti Jain, “Massively parallel, large-area maskless lithography,” Applied Physics Letters, 84, pp. 2880-2882, 2004. 10. Kanti Jain, Marc Zemel, and Marc Klosner, “Large-Area High-Resolution Lithography and Photoablation Systems for Microelectronics and Optoelectronics Fabrication,” IEEE, no.90, pp.1681-1688, 2002. 11. 吳智偉,新型光罩式快速原型系統之研發, 國立台灣科技大學纖維及高分子工程系碩士論文, 2001。 12. 張慶瑞, 電子光罩式快速原型機之開發研究,台灣科技大學自動化工程所碩士論文, 2000。 13. 陳勇嘉, 滾壓式製程於中尺寸導光板之模擬與製程研究, 中興大學精密工程研究所碩士論文, 2006 14. 賴文郎, 林宏彛, 張復瑜, 微奈米滾筒模具製程與成形技術簡介, 機械工程雜誌, 279期, 53-58, 2006. 15. Liang, Chang, Chen, David, Chung, and Jerry, “Directional diffusing film,” US-PATENT 6505959, April 23, 2001. 16. D. Khang, H. Kang, T. Kim, and H. Lee, “ Low-Pressure Nanoimprint Lithography ,” Nano Lett., Vol. 4, No. 4, pp.633-637, 2004. 17. T. Katoh, “Direct Writing for Three-Dimensional Microfabrication Using Synchrotron Radiation Etching,” The Thirteenth Annual International Conference, IEEE Journal of Micro Electro Mechanical Systems, pp. 556-561, 2000. 18. http://nano.nchc.org.tw/dictionary/Optical_Lithography.html 19. 王仲偉, 黑色反應性噴墨印花染料之合成與應用以及噴印PLED墨水之研究, 國立台北科技大學有機高分子研究所, 2004. 20. 劉德庠, 微影製程之堆疊回授控制, 大葉大學機業與自動化研究所, 2003. 21. http://www.amtc.com.tw/chinese/tech_4.aspx 22. http://china5.nikkeibp.co.jp/china/news/elec/200411/elec200411050120.html
摘要: 本論文發展出一套創新微影製程稱之為噴墨微影,運用噴墨技術繪製圖形在塗佈光阻的基材上形成光罩,墨水取代光罩的功能,運用在微結構的成形上。本製程較於一般光罩微影製程的優勢首先製程中不會使用到鉻光罩對環境的衝擊小,適合在非平面基材製作微結構,製作面積不會受到光罩限制等等。噴墨微影的噴墨系統在光阻上繪製出點陣列與直線的圖形,曝光顯影。挑選高光學濃度且適合於噴墨製程的墨水,設計噴墨機構及控制系統繪製圖形,利用噴墨技術以及微影製程在正負光阻上製作微結構。此為共型光罩技術運用噴墨為光吸收體的微影製程,所提的微製造法有助於快速微結構成型技術。
The presented paper describes a novel process using inkjet printing to pattern a mask onto photoresist for further microstructure formation. The advantages of using the inkjet printing a mask include no Cr photomask required, suitable for non-planar substrate, scalable for large area, and extreme low cost. The ink is ejected from the inkjet print-head controlled by the inkjet system. A CAD pattern from the designer can use this process to place the ink pattern onto the photoresist substrate. Following UV exposure, development, and ink removal, the designed microstructure patterns can be realized in photoresist such as lines and dots. Conventional lithography process uses a rigid photomask to pattern microstructures. It is a conformal mask using as the optical absorber in lithography process the proposed microfabrication process attributer a fast microstructure patterning technology.
URI: http://hdl.handle.net/11455/4140
其他識別: U0005-1707200710135100
文章連結: http://www.airitilibrary.com/Publication/alDetailedMesh1?DocID=U0005-1707200710135100
Appears in Collections:精密工程研究所

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