Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/4173
標題: 在聚碳酸酯基板上以直流磁控濺鍍法研製超薄金屬錫膜之特性研究
Characterization and Deposition of Ultrathin Sn Films on Polycarbonate Substrates by DC Magnetron Sputtering
作者: 汪思賢
Wang, Szu-Hsien
關鍵字: Ultrathin tin films
超薄錫膜
Resistivity
Size effect
NCVM
電阻率
尺寸效應
不導電真空金屬鍍膜
出版社: 精密工程學系所
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摘要: 塑膠表面金屬化處理是讓塑膠表面有著金屬質感的外觀,又保有質輕又抗刮的特性;因應通訊產品為了外型美觀而採用了內建天線 (internal antenna) 的設計,而塑膠外殼上所鍍上的金屬膜可能會造成對於電磁訊號傳送與接收的干擾,進而影響通訊品質,故一個新技術:不導電真空金屬鍍膜 (non-conductive vacuum metallization, NCVM) 因應而生。 本研究以直流磁控濺鍍法以沈積金屬錫 (Sn) 薄膜在塑膠 PC 基板上,而基板先以 RF 電漿處理以增加附著性。對於沈積之薄膜,利用透光率儀分析薄膜的光學性質,以薄膜厚度量測儀量膜厚,場發射掃瞄式電子顯微鏡分析薄膜之表面形貌和成長結構,以原子力顯微鏡觀察薄膜三維空間的表面形貌,利用四點探針量測片電阻值,以化學分析電子能譜儀分析薄膜成分,另以 TriScanner Pro SL 來判斷薄膜是否通過 NCVM 的標準。 藉由三個可控制的鍍膜參數: DC 功率、載盤移動時間及氬氣流量的互相搭配下,討論得到選擇低載盤移動時間 (0.5 or 1.0 sec) ,搭配適當的 DC 功率 (7 kW 以下) 與高氬氣流量 (400 sccm) ,製備的試片能通過 NCVM 標準,且能節省製程時間。為了保有金屬光澤的外觀,薄膜透光率需在10%以下,膜厚需要大於28 nm為佳。另本實驗探討的薄膜皆是在厚度100 nm以內的超薄膜。
Metallization treatment on the plastic surface can make surface with metal-like look and keep the surface being light and tough. Among all the techniques, a new technique: non-conductive vacuum metallization (NCVM) is applied in order to eliminate the disadvantages of metal coating on the plastic surface, which may cause the interruption of sending and receiving of electromagnetic signal, and this is the technique I applied in the experiment. This research used DC magnetron sputtering to deposit tin thin films on polycarbonate substrates, and the substrates were pretreated by RF plasma to improve adhesion. The characterization techniques include transmission meter for optical properties, α-step for the thickness, FESEM for the surface and growth structure, AFM for the three-dimensional look, four-point for sheet electric resistance, ESCA for the composition, and TriScanner Pro SL to determine whether the thin films pass the criterion of NCVM or not. By controlling three variables, which are DC power, travel time of carrier, and the flow rate of argon gas, we get the result that in order to meet the NCVM criterion and save the process time, the low travel time of carrier (0.5 or 1.0 sec) and appropriate DC power (below 7 kW) and high argon flow rate (400 sccm) are needed. Besides, the transmission of films must be below 10% and the film thickness must be thicker than 28 nm to maintain the metal gloss look. The films we investigated are all thinner than 100 nm.
URI: http://hdl.handle.net/11455/4173
其他識別: U0005-0608200801181700
文章連結: http://www.airitilibrary.com/Publication/alDetailedMesh1?DocID=U0005-0608200801181700
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