Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/42002
DC FieldValueLanguage
dc.contributor.authorTu, H.L.en_US
dc.contributor.author竇維平zh_TW
dc.contributor.authorYen, P.Y.en_US
dc.contributor.authorWu, H.L.en_US
dc.contributor.authorChen, S.en_US
dc.contributor.authorVogel, W.en_US
dc.contributor.authorYau, S.en_US
dc.contributor.authorDow, W.P.en_US
dc.date2010zh_TW
dc.date.accessioned2014-06-06T08:06:05Z-
dc.date.available2014-06-06T08:06:05Z-
dc.identifier.issn0013-4651zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/42002-
dc.description.abstractThe adsorption of 3-mercaptopropanesulfonate (MPS) molecule on a Pt(111) single-crystal electrode and its effect on the deposition of Cu have been examined using in situ scanning tunneling microscopy (STM). MPS admolecules were irreversibly adsorbed in a largely disordered adlayer on bare Pt(111) in 0.1 M HClO(4), irrespective of the presence of chloride, the concentration of MPS, and the applied potential. In comparison, the MPS admolecules readily formed a highly ordered molecular structure identified as (4x2 root 3)rect on Pt(111) precoated with a monolayer of Cu adatoms. The MPS admolecules were adsorbed upright on Pt(111). The cyclic voltammetric results show that the MPS adlayer on Pt(111) would inhibit Cu deposition because the addition of 10 mu M MPS to the electrolyte of 0.1 M HClO(4)+1 mM KCl+1 mM Cu(ClO(4))(2) reduced the amount of the Cu deposit by half, even in the presence of chloride. The texture of the Cu deposit also varied with the surface state of the Pt(111) electrode as the Cu film grew in three-dimensional islands and smooth flakelike morphology on the MPS-modified and Cu-coated Pt(111) electrodes, respectively. In situ STM results indicated that the MPS admolecules stayed afloat rather than buried by the Cu deposit.en_US
dc.language.isoen_USzh_TW
dc.relationJournal of the Electrochemical Societyen_US
dc.relation.ispartofseriesJournal of the Electrochemical Society, Volume 157, Issue 4, Page(s) D206-D210.en_US
dc.relation.urihttp://dx.doi.org/10.1149/1.3295713en_US
dc.subjectadsorptionen_US
dc.subjectcopperen_US
dc.subjectelectrodepositionen_US
dc.subjectorganic compoundsen_US
dc.subjectplatinumen_US
dc.subjectscanning tunnelling microscopyen_US
dc.subjectsurface statesen_US
dc.subjectvoltammetry (chemicalen_US
dc.subjectanalysis)en_US
dc.subjectscanning-tunneling-microscopyen_US
dc.subjectself-assembled monolayersen_US
dc.subjectsulfuric-acid-solutionsen_US
dc.subjectsuperconformal electrodepositionen_US
dc.subjectunderpotential depositionen_US
dc.subjectcompetitive adsorptionen_US
dc.subjectpolyethylene-glycolen_US
dc.subjectadditive systemen_US
dc.subjectcu(111)en_US
dc.subjectspsen_US
dc.titleIn Situ STM of 3-Mercaptopropanesulfonate Adsorbed on Pt(111) Electrode and Its Effect on the Electrodeposition of Copperen_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1149/1.3295713zh_TW
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