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標題: 高精度多通道光纖之平行定位模仁製程
Process development of high precision multiple -channel optical fibers in parallel alignment mold inserts
作者: 林格年
Lin, Ge-Nian
關鍵字: V-groove
anisotropic etch
Fiber array
出版社: 精密工程學系所
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摘要: 本研究之主要目的在於多通道光纖平行定位模仁製程的研究。主要利用晶格(100)之晶圓做為基材,並以非等向性蝕刻技術,製成光纖定位用之V型溝槽,以取代現有利用研磨加工製成V-groove之技術。本研究主要選用二氧化矽、氮化矽作為蝕刻之保護材料,並利用微影方式定義出蝕刻圖案區域,並以光罩之透光區為蝕刻區域,再利用KOH進行單晶矽之非等向蝕刻。本研究期能找出最適當之蝕刻溶液的濃度、溫度、時間等條件,並計算出蝕刻之速率與蝕刻之深度,以完成V-groove之微結構加工。本研究主要以32通道之光纖定位塊做為研究標的。研究結果導入電鑄翻模製程,誤差率達0.3%。未來可大量複製高精度多通道光纖定位模塊,藉此以達到降低製造成本且可滿足光通訊產業之需求。
The purpose of this study is to develop multi-channel molds for optical fiber alignment with high precision. High selective wet-etching process to fabricate multi-channel grooves for fiber alignment on Si(100) was used. It has the potential advantage to replace the conventional grinding process for v-groove production. The (100)-oriented Si wafers were used as starting substrates and then epitaxied with silicon dioxide or silicon nitride. Furthermore, samples were patterned (using photoresist), which the protected region was silicon dioxide or silicon nitride while the v-groove can be formed in the unprotected region after removal of passivation layer and KOH etching. Silicon anisotropic etching can result the desired V-grooves in silicon.Optimal etching conditions, including the etchant concentration, temperature and time can determine the etching rate and etching depth for V-groove producing micro-structures. The number of fiber channel can be defined from the mask design. Fiber channels of 32 will be the final research target. That can convert into metal molds by electroforming process, decrease the error rate under 0.3%. The implementation of a large number of multi-channel optical fiber positioning replication modules, with high precision, to reduce costs and demand for optical communication industry will be feasible.
其他識別: U0005-0107201012233400
Appears in Collections:精密工程研究所



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