Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43172
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dc.contributor.authorMao, Hsin-Yuanen_US
dc.contributor.authorWuu, Dong-Singen_US
dc.contributor.authorWu, Bing-Ruien_US
dc.contributor.authorLo, Shih-Yungen_US
dc.contributor.authorHorng, Ray-Huaen_US
dc.contributor.otherNational Chung Hsing University,Department of Materials Engineeringen_US
dc.contributor.other國立中興大學材料工程學系zh_TW
dc.date2011-4zh_TW
dc.date.accessioned2014-06-06T08:10:10Z-
dc.date.available2014-06-06T08:10:10Z-
dc.identifier.issn0254-0584zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/43172-
dc.description.abstractA two-step growth method was proposed to reduce the amorphous incubation layer in the initial growth of polycrystalline silicon (poly-Si) films prepared by hot-wire chemical vapor deposition (HWCVD). In the two-step growth process, a thin seed layer was first grown on the glass substrate under high hydrogen dilution ratios (φ ≥ 0.9), and then a thick overlayer was subsequently deposited upon the seed layer at a lower φ value. The effect of various deposition parameters on the structural properties of poly-Si films was investigated by Raman spectroscopy and transmission electron microscopy. Moreover, the electrical properties, such as dark and photo conductivities, of poly-Si films were also measured. It was found that the Si incubation layer could be suppressed greatly in the initial growth of poly-Si with the two-step growth method. In the subsequent poly-Si film thickening, a lower φ value of the reactant gases can be applied to enhance the deposition rate. Therefore, a high-quality poly-Si film can be fabricated via a two-step growth method with a sufficient growth rate using HWCVD.en_US
dc.language.isoen_USzh_TW
dc.publisherElsevier B.V.en_US
dc.relationMaterials Chemistry and Physics, Volume 126, Issue 3, Page(s) 665-668.en_US
dc.subjectThin filmsen_US
dc.subjectChemical vapor depositionen_US
dc.subjectElectron microscopyen_US
dc.subjectElectrical conductivityen_US
dc.titleHot-wire chemical vapor deposition and characterization of polycrystalline silicon thin films using a two-step growth methoden_US
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1016/j.matchemphys.2010.12.065zh_TW
dc.contributor.catalogerMiao-zhen Luoen_US
Appears in Collections:材料科學與工程學系
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