Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43315
標題: Characterization of nitrogen-doped a-C : H films deposited by cathodic-arc activated deposition process
作者: Chang, Y.Y.
吳威德
Wang, D.Y.
Wu, W.T.
關鍵字: amorphous carbon films
cathodic-arc activated deposition
wear
carbon
nitride
diamond-like carbon
amorphous-carbon
nitride films
thin-films
coatings
plasma
期刊/報告no:: Diamond and Related Materials, Volume 12, Issue 10-11, Page(s) 2077-2082.
摘要: Nitrogen-doped Cr-C:H/N films containing chromium were synthesized by using cathodic-are activated deposition (CAAD) process. Metal plasma with intensive ion energies catalyzes the decomposition of hydrocarbon gas C2H2), and results in the deposition of amorphous carbon films. Nitrogen was introduced to form nitrogen-containing Cr-C:H/N films, which contained a mixture of sp(2) and sp(3) carbon bonds. The deposited carbon films consist of nano-composite Cr-C:H/N films on top of a graded chromium nitride interlayer. The wear properties were correlated with the nitrogen doping. Cr-C:H/N films exhibits steady state friction coefficients lower than 0.11 when deposited at low N-2/C2H2 flow rate ratio ( < 15%). Cr-C:H/N possesses improved wear properties, resulting from its adhered dense microstructure and the nature of the transferred layer induced by the friction condition between the Cr-C:H/N coatings and the sliding counterpart. (C) 2003 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43315
ISSN: 0925-9635
文章連結: http://dx.doi.org/10.1016/s0925-9635(03)00290-5
Appears in Collections:材料科學與工程學系

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