Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43408
標題: Degradation of CrN films at high temperature under controlled atmosphere
作者: Lu, F.H.
呂福興
Chen, H.Y.
Hung, C.H.
關鍵字: hard coatings
oxidation behavior
nitride coatings
n coatings
tin
films
microstructure
kinetics
期刊/報告no:: Journal of Vacuum Science & Technology A, Volume 21, Issue 3, Page(s) 671-675.
摘要: The degradation of CrN films was investigated over temperatures of 400-1200 degreesC in air, nitrogen, and forming gas (N-2/H-2 = 9) by analyzing changes in color and appearance, as well as microstructures. The degradation mainly included color changes and cracks occurring on the film surface. The color change resulting from low-temperature/short-time annealing was due to the formation of an additional Cr2N phase, as well as a thin oxide overlayer. The color change appearing at higher temperatures/longer times stemmed from the formation of a thicker Cr2O3 layer, whose content depended on the pN(2)/pO(2) ratio in the atmosphere. The driving force of the oxidation was the Gibbs free-energy change for CrN and Cr2O3 . Cracks that showed up at relatively high temperatures were attributed to the large thermal mismatch between the CrN film and Cr2O3 overlayer. The thermal stresses were calculated and discussed. The degradation diagrams were generated based on the above analyzed results. (C) 2003 American Vacuum Society.
URI: http://hdl.handle.net/11455/43408
ISSN: 0734-2101
文章連結: http://dx.doi.org/10.1116/1.1566784
Appears in Collections:材料科學與工程學系

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