Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43543
標題: Tri-layer antireflection coatings (SiO2/SiO2-TiO2/TiO2) for silicon solar cells using a sol-gel technique
作者: Lien, S.Y.
武東星
Wuu, D.S.
Yeh, W.C.
Liu, J.C.
關鍵字: silicon
antireflection coating
sol-gel
TiO2
SiO2
solar cell
chemical-vapor-deposition
ar coatings
nitride
design
期刊/報告no:: Solar Energy Materials and Solar Cells, Volume 90, Issue 16, Page(s) 2710-2719.
摘要: Antireflection coatings (ARCS) have become one of the key issues for mass production of Si solar cells. They are generally performed by vacuum processes such as thermal evaporation, reactive sputtering, and plasma-enhanced chemical vapor deposition. In this work, a sol-gel method has been demonstrated to prepare the ARCS for the non-textured monocrystalline Si solar cells. The spin-coated TiO2 single-layer, SiO2/TiO2 double-layer and SiO2/SiO2-TiO2/TiO2 triple-layer ARCS were deposited on the Si solar cells and they showed good uniformity in thickness. The measured average optical reflectance (400-1000 nm) was about 9.3, 6.2 and 3.2% for the single-layer, double-layer and triple-layer ARCS, respectively. Good correlation between theoretical and experimental data was obtained. Under a triple-layer ARC condition, a 39% improvement in the efficiency of the monocrystalline Si solar cell was achieved. These indicate that the sol-gel ARC process has high potential for low-cost solar cell fabrication. (c) 2006 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/43543
ISSN: 0927-0248
文章連結: http://dx.doi.org/10.1016/j.solmat.2006.04.001
Appears in Collections:材料科學與工程學系

文件中的檔案:

取得全文請前往華藝線上圖書館



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.