Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43745
標題: The effect of substrate size on characteristics of carbon films deposited on glass plate substrates by thermal chemical vapor deposition
作者: Chen, P.Y.
薛顯宗
Shiue, S.T.
Lin, H.Y.
關鍵字: a-c-h
thin-films
amorphous-carbon
optical-properties
growth-rate
cvd carbon
microwave
hydrogen
plasma
期刊/報告no:: Physica Status Solidi a-Applications and Materials Science, Volume 206, Issue 7, Page(s) 1537-1540.
摘要: When carbon films are prepared using thermal CVD, the properties of carbon films are affected by many factors, such as the precursor gas, deposition temperature, and working pressure. It is believed that the substrate size is also an important factor in preparing carbon films by thermal CVD. Hence, this study investigates the effect of substrate size on the properties of carbon coatings that are deposited on glass plate substrates in a quartz tube furnace using thermal CVD. Experimental results show that the deposition thickness decreases with increasing silica glass-plate width, indicating that the deposition rate of carbon coatings decreases with increasing deposition area of the glass plate substrate. Meanwhile, the ordered degree and crystallite size of carbon films increase with increasing glass-plate width, while the number and size of particles on carbon-coating surfaces, surface roughness, and electrical resistivity of carbon films decrease. (C) 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
URI: http://hdl.handle.net/11455/43745
ISSN: 1862-6300
文章連結: http://dx.doi.org/10.1002/pssa.200824496
Appears in Collections:材料科學與工程學系

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