Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/43929
標題: Ultra high-density silicon nanowires for extremely low reflection in visible regime
作者: Pei, Ting-Hang
Thiyagu, Subramani
Pei, Zingway
出版社: AMER INST PHYSICS.
摘要: We fabricated large-area, vertically aligned silicon nanowire (SiNW) arrays on Si substrates employing catalytic etching on a polystyrene nanosphere template. The density of SiNWs was as high as 10(10)/cm(2), and the bottom radii of SiNWs ranged between 30 and 60 nm. The reflection from the SiNW layer was approximately 0.1% over the spectral range of 300-800nm for SiNWs longer than 750 am. Effective medium theory was applied to explain this extremely low reflection, and it was confirmed that the incident light scatters randomly inside cone-like SiNWs, which lengthens the actual traveling path of light.
URI: http://hdl.handle.net/11455/43929
ISSN: 0003-6951
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