Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/44038
標題: Effects of fluorine-implanted treatment on Ba0.7Sr0.3TiO3 films
作者: Horng, R.H.
洪瑞華
Wuu, D.S.
Leu, C.C.
Chan, S.H.
Huang, T.Y.
Sze, S.M.
武東星
關鍵字: electrical-properties
thin-films
capacitors
期刊/報告no:: Microelectronics Reliability, Volume 40, Issue 4-5, Page(s) 667-670.
摘要: The effects of F-ion implantation on the leakage and dielectric properties of the Ba0.7Sr0.3TiO3 (BST) films were investigated. The BST film implanted with 1 x 10(15) cm(-2) shows the optimum leakage performance. The leakage current density can be decreased by one order of magnitude as compared to that of the non-implanted sample at an applied voltage of 2 V. On increasing the implanted dose from 5 x 10(14) to 5 x 10(15) cm(-2), the dielectric constant first increases and then decreases due to the deteriorated crystallinity. It is found that the suitable F-ion dose can reduce the -OH contaminants and improve the dielectric and leakage properties. (C) 2000 Elsevier Science Ltd. All rights reserved.
URI: http://hdl.handle.net/11455/44038
ISSN: 0026-2714
文章連結: http://dx.doi.org/10.1016/s0026-2714(99)00315-7
Appears in Collections:材料科學與工程學系

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