請用此 Handle URI 來引用此文件: http://hdl.handle.net/11455/44097
標題: Transparent barrier coatings on flexible polyethersulfone substrates for moisture-resistant applications
作者: Wuu, D.S.
洪瑞華
Lo, W.C.
Chiang, C.C.
Lin, H.B.
Chang, L.S.
Horng, R.H.
Huang, C.L.
Gao, Y.J.
武東星
關鍵字: silicon nitride
silicon oxide
WVTR & OTR
PES
chemical-vapor-deposition
thin-films
silicon
growth
期刊/報告no:: Materials Science Forum, Volume 475-479, Page(s) 4017-4020.
摘要: Silicon nitride (SiNX) and silicon oxide (SiOX) films deposited on flexible polyethersulfone (PES) substrates by plasma-enhanced chemical vapor deposition have been investigated for water vapor transmission rate (WVTR) and oxygen transmission rate (OTR) barrier applications. Details of the NH3/SiH4 and N2O/SiH4 flow ratio effects on the SiNX and SiOX properties in terms of transmittance, refractive index, surface morphologies, OTR and WVTR were investigated. Under optimum conditions, the WVTR and OTR for SiOX/PES can be reduced from a level of 28 g/m(2)/day and 243 cc/m(2)/day (bare substrate) to 0.15g/m(2)/day and 0.25 cc/m(2)/day. Furthermore, the WVTR and OTR for SiNX/PES can be reduced to 0.01 g/m(2)/day and 0.01 cc/m(2)/day. The transparency of the barrier coatings can achieve over 80%. As a result of experiments, the deposition of SiOX and SiNX thin films on PES plastic substrates can resist the moisture and oxygen transmission sufficiently.
URI: http://hdl.handle.net/11455/44097
ISSN: 0255-5476
顯示於類別:材料科學與工程學系

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