Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/45006
標題: A MEMS micromirror fabricated using CMOS post-process
作者: Cheng, Y.C.
戴慶良
Dai, C.L.
Lee, C.Y.
Chen, P.H.
Chang, P.Z.
關鍵字: MEMS
CMOS process
CMOS-MEMS
mirrors
期刊/報告no:: Sensors and Actuators a-Physical, Volume 120, Issue 2, Page(s) 573-581.
摘要: This work describes the fabrication of a micromachined micromirror by the conventional 0.35 mu m CMOS process and a simple maskless post-CMOS process. The micromirror contains a rectangular mirror plate and four pairs of serpentine supported beams, is integrated with a 1 x 4 demultiplexer and a four-stage charge pump circuits on a chip. Maskless dry and wet etching processes are the only requirement to suspend the structure. The primary limitation in the fabrication of microstructures has been overcome by the development of a hybrid processing technique, which combines both an anisotropic dry etch and an isotropic wet etch step. A highly reliable wet etching step with high selectivity between aluminum and sacrificial oxide is also reported. Experimental results reveal that the micromirror has a tilting angle of around 5 degrees at operation voltage of 22.5 V and a dynamic response less than 5 ms. The surface properties of the CMOS micromirror, detailed process flows, measurement set-up and the experimental results are also presented in this work. (c) 2005 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/45006
ISSN: 0924-4247
文章連結: http://dx.doi.org/10.1016/j.sna.2005.02.009
Appears in Collections:機械工程學系所

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