Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46579
標題: New high fill-factor dual-curvature microlens array fabrication using UV proximity printing
作者: Lin, Tsung-Hung
Yang, Hsiharng
Chao, Ching-Kong
Hung, Shih-Yu
Hsu, Jen-Sung
出版社: Springer
摘要: A new high fill-factor dual-curvature microlens array fabrication method using lithographic proximity printing process is reported. The proposed technology utilizes UV proximity printing by controlling a printing gap between the mask and substrate. The designed microlens array pattern with high density can produce a high fill-factor dual-curvature microlens array in photoresist. Because the UV light diffraction deflects away from the aperture edges and produces exposure in photoresist material outside the aperture edges, this method can precisely control the geometric profile of a high fill factor dual-curvature microlens array. The experimental results showed that the dual-curvature micro-lens array can be formed automatically in photoresist when the printing gap ranged from 360 to 600 μm. The gapless dual-curvature microlens array will be used to enhance the luminance uniformity for light-emitting diodes (LEDs).
URI: http://hdl.handle.net/11455/46579
ISSN: 0946-7076
Appears in Collections:精密工程研究所

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