Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/46756
標題: (2000 IEDMS Symposium A,p285-p288)High crystallinity and large grain size c-Si:H films deposition by ECR-CVD
作者: Y. L. Jiang
S. H. Chen
L. H. Chen
K. S. Lin
W. H. Wu
C. H. Wu
Y. S. Liao
L. H. Chang
關鍵字: High crystallinity
large grain size
c-Si:H films deposition
ECR-CVD
URI: http://hdl.handle.net/11455/46756
Appears in Collections:光電工程研究所

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