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標題: (1st Asia-Pacific International Symposium on the Basic and Application of Plasma Technology,p195-p198)Characterization of a-SiGe:H Films Deposited by Pulse RF Power
作者: Y. L. Jiang
T. Y. Yew
關鍵字: a-SiGe:H Films
Pulse RF Power
出版社: Yeulin:Lunghwa University of Science and Technology
Appears in Collections:光電工程研究所



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