Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/48634
標題: Investigation of Sputtering Thin Film Electrodes for (Ba,Sr)TiO/sub 3/ Dynamic Random Access Memory Capacitors (III)
動態記憶體中高介電鈦酸鍶鋇薄膜電容之研發---子計畫II:鈦酸鍶鋇濺鍍電極之研製(III)
作者: 洪瑞華
關鍵字: 電子電機工程類, 資訊工程--硬體工程
應用研究
URI: http://hdl.handle.net/11455/48634
其他識別: NSC89-2215-E005-007
文章連結: http://grbsearch.stpi.narl.org.tw/GRB/result.jsp?id=720178&plan_no=NSC89-2215-E005-007&plan_year=89&projkey=PB9106-0581&target=plan&highStr=*&check=0&pnchDesc=%E5%8B%95%E6%85%8B%E8%A8%98%E6%86%B6%E9%AB%94%E4%B8%AD%E9%AB%98%E4%BB%8B%E9%9B%BB%E9%88%A6%E9%85%B8%E9%8D%B6%E9%8B%87%E8%96%84%E8%86%9C%E9%9B%BB%E5%AE%B9%E4%B9%8B%E7%A0%94%E7%99%BC---%E5%AD%90%E8%A8%88%E7%95%ABII%EF%BC%9A%E9%88%A6%E9%85%B8%E9%8D%B6%E9%8B%87%E6%BF%BA%E9%8D%8D%E9%9B%BB%E6%A5%B5%E4%B9%8B%E7%A0%94%E8%A3%BD%28III%29
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