Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/58896
標題: (Amorphous and Microcrystalline Semiconductor Devices,Vol.II:613-640)Ch13 Resonant Tunneling,Hot Electron Generation and Random Telegraphic Noise in Amorphous Double Barrier Structures
作者: H. L. Hwang
Y. L. Jiang
關鍵字: Resonant Tunneling
Hot Electron Generation
Random Telegraphic Noise
Amorphous Double Barrier Structures
出版社: Boston,USA:Artech House
URI: http://hdl.handle.net/11455/58896
Appears in Collections:光電工程研究所

文件中的檔案:

取得全文請前往華藝線上圖書館



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.