Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/68054
標題: The effect of trimethylgallium flows in the AIInGaN barrier on optoelectronic characteristics of near ultraviolet light-emitting diodes grown by atmospheric pressure metalorganic vapor phase epitaxy
作者: Fu, Y.K.
Jiang, R.H.
Lu, Y.H.
Chen, B.C.
Xuan, R.
Fang, Y.H.
Lin, C.F.
Su, Y.K.
Chen, J.F.
期刊/報告no:: Applied Physics Letters, Volume 98, Issue 12.
摘要: The letter reports a theoretical and experimental study on the device performance of near ultraviolet light-emitting diodes (LEDs) with quaternary AlInGaN quantum barrier (QB). The indium mole fraction of AlInGaN QB could be enhanced as we increased the trimethylgallium flow rate. It was found the AlInGaN/InGaN LEDs can reduce forward voltage and improve light output power, compared with conventional GaN QB. By using advanced device simulation, it should be attributed to a reduction in lattice mismatch induced polarization mismatch in the active layer, which results in the suppression of electron overflow. (C) 2011 American Institute of Physics. [doi:10.1063/1.3571440]
URI: http://hdl.handle.net/11455/68054
ISSN: 0003-6951
文章連結: http://dx.doi.org/10.1063/1.3571440
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