Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/68066
標題: Characterization of tungsten-titanium oxide electrode for electrochromic applications
作者: Weng, K.W.
Han, S.
Chen, Y.C.
Wang, D.Y.
關鍵字: Titanium oxide
Co-sputtering
Eelectrochromic behavior
wo3 thin-films
deposition
efficiency
mechanism
trioxide
growth
oxygen
期刊/報告no:: Applied Surface Science, Volume 255, Issue 6, Page(s) 3848-3853.
摘要: Titanium oxide films are of critical importance for the electrochromic device technology. The substrate, a conductive glass being coated with indium tin oxide (ITO) thin films, was deposited tungsten and titanium oxide by pulsed co-sputtering deposition system. The film thickness increased with the ion beam power. However, the slope of the curve of thickness against power at an ion beam power of less than 300 W was greater than that at a power of 400 or 500 W. A high ion beam power resulted produced a crystalline structure, as revealed by X-ray diffraction (XRD). Moreover, increasing the ion beam power resulted in the high Li-ions transport. The electrochromic behavior was optimal at an ion beam power of 200 W. (c) 2008 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/68066
ISSN: 0169-4332
文章連結: http://dx.doi.org/10.1016/j.apsusc.2008.10.071
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