Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/70072
標題: Positive exchange bias in a Ni(80)Fe(20)/Ni(x)Fe(1-x)O thin-film bilayer
作者: Lin, K.W.
Tzeng, Y.M.
Guo, Z.Y.
Liu, C.Y.
van Lierop, J.
關鍵字: Exchange bias
Thin-film
Ion-beam sputter deposition
期刊/報告no:: Journal of Magnetism and Magnetic Materials, Volume 304, Issue 1, Page(s) E124-E127.
摘要: We have measured positive exchange bias in a Ni(80)Fe(20)/Ni(x)Fe(1-x)O thin-film nanocrystallite system. A series of solid solution Ni(x)Fe(1-x)O 40 nm thick films capped with 25 nm thick Ni(80)Fe(20) were deposited using a range of %O(2)/Ar bombardment energies (i.e. End-Hall voltages). Proper tuning of the deposition conditions results in a Ni(80)Fe(20)/Ni(x)Fe(1-x)O (30% O(2)/Ar) based bilayer that exhibits a positive exchange bias loop shift of H(ex)similar to 60 Oe at 150 K. (C) 2006 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/70072
ISSN: 0304-8853
文章連結: http://dx.doi.org/10.1016/j.jmmm.2006.02.021
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