請用此 Handle URI 來引用此文件: http://hdl.handle.net/11455/70832
標題: Effects of MPII-implanted titanium on the electrochromic properties of tungsten trioxide
作者: Weng, K.W.
Han, S.
Chen, Y.C.
Chuang, H.C.
關鍵字: thin film
tungsten trioxide
metal-plasma ion implantation
optical
density
thin-films
gas sensors
oxide
efficiency
oxygen
xps
期刊/報告no:: Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms, Volume 266, Issue 7, Page(s) 1069-1073.
摘要: There are great interests in electrochromic (EC) technology for smart windows and displays over the last decade. The substrate, a conductive glass being coated indium tin oxide (ITO) thin films, deposited tungsten trioxide (WO3) using radio-frequency (RF) sputtering and implanted Ti by a metal-plasma ion implantation (MPII) in this study. The optical density (when the implanted dose is less than 2 x 10(15) ionS/cm(2)) is approximately 1.6 times the unimplanted Ti. At low implanted dose +6 valence tungsten ions improve optical density. At high implanted dose, low-valence tungsten ions reduce the optical density. (c) 2008 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/70832
ISSN: 0168-583X
文章連結: http://dx.doi.org/10.1016/j.nimb.2008.02.031
顯示於類別:期刊論文

文件中的檔案:
沒有與此文件相關的檔案。


在 DSpace 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。