Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71216
標題: EFFECTS OF TEMPERATURE ON THE PROPERTIES OF TiO2 PHOTOCATALYSTS PREPARED BY THE CHEMICAL VAPOR DEPOSITION (CVD) METHOD
作者: Wang, K.H.
Hsieh, Y.H.
Lin, T.T.
Chang, C.Y.
關鍵字: Titanium dioxide
chemical vapor deposition
photocatalysis
films
期刊/報告no:: Reaction Kinetics and Catalysis Letters, Volume 95, Issue 1, Page(s) 39-46.
摘要: In this study, a TiO2 film was prepared in an annular reactor by the chemical vapor deposition (CVD) method. Results indicated that anatase crystals were formed, except for at a deposition temperature of 200 degrees C without calcination. At a calcination temperature of 850 degrees C, anatase crystal was the major species formed with a small amount of rutile crystals. After conducting a photocatalytic reaction of toluene, the best activity was found with a preparation temperature of 350 degrees C for the deposition, and 550 degrees C for calcination.
URI: http://hdl.handle.net/11455/71216
ISSN: 0133-1736
文章連結: http://dx.doi.org/10.1007/s11144-008-5317-3
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