Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71363
標題: Effects of nitrogen partial pressure on titanium oxynitride films deposited by reactive RF magnetron sputtering onto PET substrates
作者: Lin, M.C.
Chang, L.S.
Lin, H.C.
關鍵字: Titanium oxynitride
Magnetron sputtering
Polyethylene terephthalate
Gas permeation
tinxoy thin-films
期刊/報告no:: Surface & Coatings Technology, Volume 202, Issue 22-23, Page(s) 5440-5443.
摘要: Titanium oxynitride (TiNxOy) films have been deposited onto polyethylene terephthalate (PET) substrates by reactive radio frequency (RF) magnetron sputtering. The influence of the nitrogen (N-2) partial pressure in the discharge atmosphere, with a set pressure of 0.133 Pa, was examined. Other deposition conditions were held constant. The deposition rate of the films, which exhibit an island-type morphology, was found to decrease with increasing N-2 partial pressure. This concurred with an increase in the surface roughness at higher N-2 partial pressure. The TiNxOy films deposited at N-2 partial pressures from 0.26x 10(-1) Pa to 0.8 x 10(-1) Pa possess Ti:N:O ratio of about 1:0.9:0.8 to 1: 1.2:0.7. At the lowest N-2 partial pressure of 0.26 x 10(-1) Pa, the water vapor (WV) and oxygen transmission rates (OTR) of the TiNxOy films reached values as low as 0.31 g/m(2)-day-atm and 0.62 cc/m(2)-day-atm, respectively; these values are about 16 and 50 times lower than those of the uncoated PET Substrate. (C) 2008 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/71363
ISSN: 0257-8972
文章連結: http://dx.doi.org/10.1016/j.surfcoat.2008.06.066
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