Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/71491
標題: Optimization of field emission properties of carbon nanotubes by Taguchi method
作者: Ting, J.H.
Chang, C.C.
Chen, S.L.
Lu, D.S.
Kung, C.Y.
Huang, F.Y.
關鍵字: carbon
Raman scattering
chemical vapor deposition (CVD)
field
emission
期刊/報告no:: Thin Solid Films, Volume 496, Issue 2, Page(s) 299-305.
摘要: It is the purpose of this study to evaluate the field emission property of carbon nanotubes (CNTs) prepared by microwave plasma-enhanced chemical vapor deposition (MPCVD) method. Nickel layer of 5 nm in thickness oil 20-nrn thickness titanium nitride film was transformed into discrete islands after hydrogen plasma pretreatment. CNTs were then grown LIP Oil Ni-coated areas by MPCVD. Through the practice of Taguchi method, superior CNT films with very low emission onset electric field, about 0.7 V/mu m (at J = 10 mu A/cm(2)), are attained without post-deposition treatment. It is found that microwave power has the most important influence on the field emission characteristics of CNT films. The increase of methane flow ratio will downgrade the degree of graphitization of CNT and thus its field emission characteristics. Scanning electron microscope and transmission electron microscopy (TEM) observation and energy dispersive X-ray spectrometer analysis reveal that CNT growth by MPCVD is based oil tip-growth mechanism. TEM micrographs validate the hollow, bamboo-like structure of the multi-walled CNTs. (c) 2005 Elsevier B.V. All rights reserved.
URI: http://hdl.handle.net/11455/71491
ISSN: 0040-6090
文章連結: http://dx.doi.org/10.1016/j.tsf.2005.08.372
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