Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/86273
DC FieldValueLanguage
dc.contributor.authorCho, Yun-Shaozh_TW
dc.contributor.authorHsu, Chia-Hsunzh_TW
dc.contributor.authorLien, Shui-Yangzh_TW
dc.contributor.authorWuu, Dong-Singzh_TW
dc.contributor.authorHan, Pinzh_TW
dc.contributor.authorChen, Chia-Fuzh_TW
dc.contributor.authorWang, Jui-Haozh_TW
dc.date2014-
dc.date.accessioned2015-08-03T07:24:15Z-
dc.date.available2015-08-03T07:24:15Z-
dc.identifier.issn0093-3813zh_TW
dc.identifier.issn1939-9375zh_TW
dc.identifier.urihttp://hdl.handle.net/11455/86273-
dc.language.isoen_USzh_TW
dc.relationIEEE Transactions on Plasma Science, Volume 42, Issue 12, Page(s) 3786-3791.zh_TW
dc.titleEffect of Plasma Radical Composition in Intrinsic a-Si:H on Performances of Heterojunction Solar Cellszh_TW
dc.typeJournal Articlezh_TW
dc.identifier.doi10.1109/TPS.2014.2333514zh_TW
Appears in Collections:材料科學與工程學系
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