Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/91774
標題: Ab-initio Study of Gd2O3 Heteroepitaxy on Si
氧化釓異質磊晶於矽之全始算研究
作者: Chung-Hsin Lin
林忠信
關鍵字: first-principles
Gd2O3
Si
interfacial energy
bixbite structure
第一原理計算
氧化釓

界面能
方鐵錳礦結構
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摘要: This thesis calculates the interface energy of the bixbite Gd2O3 heterogeneous epitaxial growth on the diamond-structure silicon by utilizing first-principles within density-functional theory. Moreover, the atomic arrangement at the interface of Gd2O3(111)/Si(111) is studied through analyzing the interface models. The results show that the most stable atomic bonding at the interface is O-Si; meanwhile, the lowest surface energy at 0.037 eV/A2 is obtained for the Gd-terminated Gd2O3 epitaxially grown on the Si in the Gd-rich atmosphere, which possesses of the electron density at 0.32 electrons/A3.
本論文係以第一原理(First-principles)密度泛函理論(Density functional theory, DFT)研究方鐵錳礦氧化釓異質磊晶成長於鑽石結構矽基板上之界面能,並透過分析Gd2O3(111)/Si(111)最穩定異質界面模型,以研究氧化釓薄膜在界面處之原子排列。在Gd2O3(111)之表面能研究中,Gd-terminated Gd2O3(111)比O-terminated Gd2O3(111)具有更穩定的表面型態,且O-terminated Gd2O3(111)越靠近O-rich端時其表面會越粗糙。從Gd2O3(111)/Si(111)異質界面之界面能研究中得知,最穩定界面結構鍵結為O-Si鍵之Gd-terminated Gd2O3磊晶成長在矽上,且在Gd-rich化學氣氛下有最低界面能0.037 eV/A2,界面處之電子密度為0.32 electrons/A3,表明了Gd2O3(111)/Si(111)異質界面有很強的鍵結,其界面結構具有Gd-O-Si鍵結存在,另外由界面鍵結與界面形態關係表得知,當界面鍵結為Gd-Si鍵時其界面結構為不穩態。
URI: http://hdl.handle.net/11455/91774
文章公開時間: 10000-01-01
Appears in Collections:精密工程研究所

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