Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/91777
標題: Ab-initio Study of GaN(0001)/TiN(111) Heterostructures
氮化鎵/氮化鈦異質界面結構之第一原理研究
作者: Wen-Han Yang
楊文翰
關鍵字: first-principles
GaN, TiN
interface energy
valence band offsets
第一原理
氮化鎵
氮化鈦
界面能
價帶偏移
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摘要: In this work, the heteroepitaxial growths of wurtzite GaN(0001) on fcc TiN(111) were studied by doing the first-principles calculations. For N-polar GaN grown on TiN under N-rich and Ga-rich ambients, the interface energy of GaN(0001)/TiN(111) heterojunction would have a minimal value of −0.064 eV/Å2 while N−Ti bonds are present in the interface structure. Moreover, the result from the band offset calculations of GaN(0001)/TiN(111) reveals the lowest interfacial energy at 3.79 eV. This result agrees with the previous work that successfully grew epitaxial GaN on sapphire with TiN buffer layer by metal organic chemical vapor deposition. Keywords: first-principles, GaN, TiN, interface energy, valence band offsets.
本論文係以第一原理(First-principles)密度泛函理論(Density functional theory, DFT)研究烏采結構氮化鎵薄膜異質磊晶成長於面心立方結構氮化鈦的異質界面之界面能,並透過分析GaN(0001)/TiN(111)最穩定異質界面模型以研究氮化鎵薄膜在界面處之原子排列。在GaN(0001)/TiN(111)異質界面之界面能研究中,最穩定界面結構鍵結為N-Ti鍵且於N-rich與Ga-rich化學氣氛下之N-polar GaN磊晶成長在TiN上有最低界面能−0.064 eV/Å2。在GaN(0001)/TiN(111)異質界面之能帶偏移(Band offset)研究中,最穩定界面結構與界面能研究結果一致,能帶偏移計算結果得出氮化鎵(0001)與氮化鈦(111)最低值為3.79 eV,證實此界面鍵結結構可以得到高品質的氮化鎵薄膜。 關鍵詞:第一原理、氮化鎵、氮化鈦、界面能、價帶偏移。
URI: http://hdl.handle.net/11455/91777
文章公開時間: 2018-08-05
Appears in Collections:精密工程研究所

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