Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/91803
DC FieldValueLanguage
dc.contributorHsiharng Yangen_US
dc.contributor楊錫杭zh_TW
dc.contributor.authorJhe-Huan Jhangen_US
dc.contributor.author張哲煥zh_TW
dc.contributor.other精密工程學系所zh_TW
dc.date2014zh_TW
dc.date.accessioned2015-12-11T07:28:11Z-
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dc.identifier.urihttp://hdl.handle.net/11455/91803-
dc.description.abstractThis paper is to explore a dual-curvature with dual-focus microlens array fabrication by diffuser lithography process. First part is to combine the diffuser lithography and hot-melt method by using JSR-126 and AZ-4620 photoresists to produce dual-layered microlens array. Second part is to design different sizes of upper and lower masks, as well as simulation and measurement. In first part, the research is to produce lower curve microlens by using diffuser lithography and JSR-126 negative photoresist. Then upper curve microlens is produced by using melt method and AZ-4620 positive photoresist. The research is exploring related dimensions of lower layer and upper layer masks for such dual curvature microlens, and using the optical simulation software TracePro to measure the light energy distribution. The results showed combined with the lower layer with 100 μm and upper layer with 75 μm may result in uniform light distribution. It can be concluded the lower and upper mask layers with the 3/4 ratio is the best effect.en_US
dc.description.abstract本研究使用擴散微影法的製程方式,去探討具有不同曲率的雙層微透鏡陣列,研究分為兩個部份,第一個部分是結合擴散微影法與熱熔法的製程方式,並使用JSR-126負光阻與AZ-4620正光阻來製作雙層微透鏡。第二部分為設計不同的上下層光罩尺寸,並進行模擬量測。在第一部分中,以擴散微影法與JSR-126負光阻製作下層微透鏡,再以熱熔法與AZ-4620正光阻製作上層微透鏡,此法具有製程簡易與成形快速之優點。而在第二步是去探討上下層光罩尺寸的搭配,再利用光學模擬軟體TracePro去量測其光能量分布,發現下層100 μm、上層為75 μm之尺寸搭配,能量分布最為均勻,推論出上下層比例為3/4之光罩效果最佳,進而得以完成雙層雙焦點之微透鏡陣列。zh_TW
dc.description.tableofcontents摘要 i Abstract ii 目次 iii 圖目錄 v 表目錄 vii 第一章 緒論 1 1.1 前言 1 1.2 研究動機與目的 2 1.3 研究方法與目標 2 1.4 論文架構 3 第二章 文獻回顧 4 2.1 光學微透鏡製程 4 2.1.1 熱熔法 4 2.1.2 液滴法 5 2.1.3 灰階光罩法 6 2.1.4 準分子雷射加工法 7 2.1.5 鑽石鉋削法 8 2.1.6 擴散微影法 9 2.2 雙曲率雙層微透鏡之製程 11 2.2.1 雙層微透鏡製程 11 2.2.2 雙層微透鏡之折射率研究 12 2.3 雙層透鏡在指紋掃描機之應用 13 2.3.1 非球面微透鏡陣列 13 2.3.2 非接觸式指紋掃描機 14 第三章 基礎理論 15 3.1 幾何光學 15 3.1.1 光的直線傳播定律 15 3.1.2 光的獨立傳播定律 15 3.1.3 反射定律 15 3.1.4 折射定律 16 3.2 物理光學 17 3.2.1 散射理論 17 3.2.2 繞射理論 18 3.3 球面像差 18 第四章 光學模擬 20 4.1 TracePro光學軟體簡介 20 4.2 光學系統設計模擬與分析討論 20 4.2.1 光學模擬參數設計 20 4.2.2 光學模擬系統建立 21 4.2.3 光學模擬結果 21 4.2.4模擬結論分析探討 28 第五章 實驗製程規劃與製作 29 5.1 實驗流程規劃 29 5.2 實驗製程 30 5.2.1 光罩設計 30 5.2.2 微透鏡製程 32 5.2.3 基板前處理 35 5.2.4 光阻塗佈 36 5.2.5 軟烤(曝前烤) 36 5.2.6 UV曝光 37 5.2.7 硬烤(曝後烤) 39 5.2.8 顯影 39 5.2.9 熱熔製程 40 5.2.10 微影製程參數 40 5.3 真空濺鍍製程 42 第六章 實驗結果量測與分析 43 6.1 光學顯微鏡量測結果 43 6.2 3D共軛聚焦儀量測結果 44 6.3 電子顯微鏡量測結果 49 6.4 量測結果分析與探討 50 6.4.1圓之間距與微透鏡外形-關係分析 50 6.4.2曝光時間與微透鏡外形-關係分析 51 6.4.3熱熔時間與微透鏡外形-關係分析 51 6.5 製程優勢比較 52 第七章 結論與未來展望 53 7.1 結論 53 7.2 未來展望 53 參考文獻 54 附錄 57 附錄A 製程儀器設備 57 附錄B 量測儀器設備 60zh_TW
dc.language.isozh_TWzh_TW
dc.rights同意授權瀏覽/列印電子全文服務,2016-07-03起公開。zh_TW
dc.subjectlithography processen_US
dc.subjectmicrolens arrayen_US
dc.subjectopticsen_US
dc.subject微影製程zh_TW
dc.subject微透鏡陣列zh_TW
dc.subject光學zh_TW
dc.titleResearch of Producing Dual-Curvature with Dual-Focus Microlens Arrayen_US
dc.title雙層曲率雙焦點微透鏡陣列之研究zh_TW
dc.typeThesis and Dissertationen_US
dc.date.paperformatopenaccess2016-07-03zh_TW
dc.date.openaccess2016-07-03-
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