Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/93968
標題: Hot-wire chemical vapor deposition of nanocrystalline silicon for ambipolar thin-film transistor applications
作者: Bing-Rui Wu
Tsung-Hsien Tsai
Dong-Sing Wuu
URI: http://hdl.handle.net/11455/93968
Appears in Collections:材料科學與工程學系

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