Please use this identifier to cite or link to this item: http://hdl.handle.net/11455/95789
標題: Modifying exchange bias effects of Mn/NiFe bilayers by in-situ Ar+ bombardment
作者: G.L. Causer
P.K. Manna
C.-C. Chiu
J. van Lierop
M. Ionescu
林克偉
K.-W. Lin
F. Klose
關鍵字: Magnetism
Thin films
Exchange bias
Ion-bombardment
出版社: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
摘要: In this work, we present a procedure to modify the exchange bias (EB) properties of antiferromagnetic Mn/ferromagnetic NiFe bilayers by in-situ low energy Ar+ bombardment of the Mn layer during sample deposition. We present structural and magnetic results for unassisted and Ar+ assisted Mn/NiFe bilayers. X-ray diffraction, transmission electron microscopy and electron diffraction results establish different preferred Mn orientation directions between the two samples as a result of the Ar+ bombardment process. Hysteresis loops taken over several temperatures reveal that samples assisted with Ar+ ions during the Mn layer deposition had suppressed EB properties at low temperature as compared to samples grown without Ar+ assistance.
URI: http://hdl.handle.net/11455/95789
文章連結: https://www.sciencedirect.com/science/article/pii/S0168583X17303671
Appears in Collections:材料科學與工程學系

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