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標題: Development of method for preparation of surface-enhanced substrate based on chemical techniques of chemical plating, imprinting and etching
作者: Yi-Cun Ye
關鍵字: 化學鍍金法
surface-enhanced substrate
chemical plating, imprinting and etching
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摘要: In this study, a new method to prepare surface-enhanced active substrate was proposed. In this method, continuous silver thin films and discontinuous silver nanoparticles (AgNPs) were prepared on glass plate were transferred to a polymer solid support for chemical etching to form surface-enhanced active substrate. With this transferring technique, the instability of silver thin film or AgNPs on glass plate during chemical etching could be overcome. UV glue was used as polymer solid support because it interacts strongly with silver and the polymerization is simple via an UV irradiation. The strong interaction between UV glue and silver thin film or AgNPs allows further treatment by chemical etching during preparation of surface-enhanced active substrates. The detail influences in preparation of surface-enhanced active substrate was systematically studied. For silver thin film on glass, the formula to prepare hollow waveguide was used and modified. The effects of agitation and sensitizer were studied and the results indicated that the reaction solution requires stirring but the speed is not critical. Also, the silver plating efficiency is high as continuous thin films can be formed within 1 min. For AgNPs, the formula to prepare SERS active substrate was used directly but the effect of reaction time was studied. After transferring silver thin film or AgNPs from glass plate to UV glue, the formed Ag@UV film was subjected to 8 M nitric acid to partially etch the silver thin film or the AgNPs. Results indicate that silver thin film or AgNPs on UV glue could be partially removed to form surface-enhanced active substrate for SERS measurement. The SERS performance is worse than method based on conventional silver mirror reaction. However, the adjustable physical property of UV glue allows a much better design for SERS measurements.
本研究開發出簡易的化學製備法成功製備出高平整度銀膜,再進一步結合模板轉印技術以及化學侵蝕法後,更成功應用到表面增強拉曼散射(Surface Enhanced Raman Scattering, SERS)基板的製備上。開發的方法首先製備出連續銀膜與銀奈米粒基板後再透過轉印方式,轉印到高分子基材上,形成的轉印基板穩定性高,可以再利用硝酸侵蝕出具表面訊號增益現象的銀奈米基板。此方法主要能克服一般修飾銀奈米粒在固體支撐基板上不耐化學侵蝕之特性,如銀與玻璃間作用力弱導致常導致大片銀粒剝落,而無法精確觀察出硝酸的對銀的侵蝕效果;轉印高分子採用UV膠水,主因乃UV膠以紫外光照射即可快速固化,且容易與銀金屬作用不易與支撐固體基板作用,因此固化後穩定但又可以輕易的將銀從原基板轉移出來貼覆到固化UV膠上。 為了解各種因子對轉印侵蝕法製作表面訊號增益基板的影響,本研究首先開發製作銀連續模修飾基板以及銀奈米粒修飾基板的方法,且分別探討影響因子的貢獻,接著探討銀連續模修飾基板以及銀奈米粒修飾基板的轉印效果,並進一步探討轉印後基板以酸蝕法製作出表面訊號增益基板的效果。結果顯示,利用銀鏡反應可以在玻璃基板上製備出高反射率的連續銀膜,透過測試各個製備因子對連續膜製作的影響,如反應液濃度,磁石攪拌速度,敏化劑的濃度等,都能夠簡單製成高反射率的連續銀膜,且反應時間短不超過1分鐘。而銀奈米粒的製作是直接參考文獻的方法但是反應時間上的條件選用有所不同。銀奈米粒轉移後用硝酸侵蝕並沒有明顯提升拉曼訊號,而在使用8 M硝酸做侵蝕時,UV膠表面的銀層才被快速溶解掉。整體研究結果而言,新方法克服了化學侵蝕法不穩定的缺點,也顯示此種方法具有成為製備表面訊號增益基板的潛力。
文章公開時間: 2017-08-31
Appears in Collections:化學系所



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