Showing results 8 to 27 of 167
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Issue Date | Title | Author(s) | Text |
- | Characterization of titanium nitride films deposited by cathodic are plasma technique on copper substrates | Lu, F.H.; 呂福興; Chen, H.Y. | - |
- | Comparative study of low dielectric constant material deposited using different precursors | Wei, B.J.; 呂福興; Cheng, Y.L.; Lu, F.H.; Chiu, T.J.; Shih, H.C. | - |
- | Corrosion and tribological studies of chromium nitride coated on steel with an interlayer of electroplated chromium | Han, S.; 呂福興; Lin, J.H.; Tsai, S.H.; Chung, S.C.; Wang, D.Y.; Lu, F.H.; Shih, H.C. | - |
- | Corrosion resistance of BaTiQ(3) films prepared by plasma electrolytic oxidation | Wu, C.T.; 呂福興; Lu, F.H. | - |
- | Corrosion resistance of chromium nitride on low alloy steels by cathodic arc deposition | Han, S.; 呂福興; Lin, J.H.; Wang, D.Y.; Lu, F.H.; Shih, H.C. | - |
- | Degradation of CrN films at high temperature under controlled atmosphere | Lu, F.H.; 呂福興; Chen, H.Y.; Hung, C.H. | - |
- | Degradation of CrN films at high temperature under controlled atmosphere | 洪志宏 | - |
- | The degradation of TiN films on Cu substrates at high temperature under controlled atmosphere | Lu, F.H.; 呂福興; Feng, S.P.; Chen, H.Y.; Li, J.K. | - |
- | Degradation of ZrN films at high temperature under controlled atmosphere | Lu, F.H.; 呂福興; Lo, W.Z. | - |
- | Development of Low-Temperature Processes for Dielectric Coatings and Their Applications in the Advanced Information Technology (I) | 薛富盛; 呂福興; 何永鈞; 吳宗明; 武東星 | - |
- | Development of Low-Temperature Processes for Dielectric Coatings and Their Applications in the Advanced Information Technology(III) | 薛富盛; 吳宗明; 何永鈞; 武東星; 呂福興 | - |
- | Dielectric properties of high-density-plasma fluorinated-silicate glass by doping nitrogen | Wei, B.J.; 呂福興; Cheng, Y.L.; Wang, Y.L.; Lu, F.H.; Shih, H.C. | - |
- | The effect of Cr interlayer on the microstructure of CrN coatings on steel | Han, S.; 呂福興; Lin, J.H.; Guo, X.J.; Tsai, S.H.; Su, Y.O.; Huang, J.H.; Lu, F.H.; Shih, H.C. | - |
- | Effect of metal vapor vacuum arc Cr-implanted interlayers on the microstructure of CrN film on silicon | Han, S.; 呂福興; Chen, H.Y.; Chang, Z.C.; Lin, J.H.; Yang, C.J.; Lu, F.H.; Shieu, F.S.; Shih, H.C.; 薛富盛 | - |
- | Effects of MEVVA-implanted chromium on the structure and properties of CrN film | Han, S.; 呂福興; Chen, H.Y.; Chang, K.L.; Weng, K.W.; Wang, D.Y.; Lu, F.H.; Shih, H.C. | - |
- | Effects of process parameters on the properties of carbon coatings for optical fibers prepared by plasma enhanced chemical vapor deposition | 林宏謙; Lin, Hung-Chien | - |
- | Electrochemical Synthesis and Characterization of Barium Titanate Films | 伍祖聰; Wu, Chu-Tsun | - |
- | Epitaxial growth of BaTiO3 films on TiN/Si substrates by a hydrothermal-galvanic couple method | Chieh, Y.C.; 呂福興; Yu, C.C.; Lu, F.H. | - |
- | Eutectic reaction between copper oxide and titanium dioxide | Lu, F.H.; 呂福興; Fang, F.X.; Chen, Y.S. | - |
- | Evaluation of Poisson's ratio and Young's modulus of nitride films by combining grazing incidence X-ray diffraction and laser curvature techniques | Chen, H.Y.; 呂福興; Chen, J.H.; Lu, F.H. | - |