Browsing by Author 戴慶良


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Issue DateTitleAuthor(s)Text
-Manufacture of a Polyaniline Nanofiber Ammonia Sensor Integrated with a Readout Circuit Using the CMOS-MEMS TechniqueLiu, M.C.; 戴慶良; Dai, C.L.; Chan, C.H.; Wu, C.C.-
-Manufacture of Micromirror Arrays Using a CMOS-MEMS TechniqueKao, P.H.; 戴慶良; Dai, C.L.; Hsu, C.C.; Wu, C.C.-
-A maskless post-CMOS bulk micromachining process and its applicationDai, C.L.; 戴慶良; Chiou, J.H.; Lu, M.S.C.-
-A maskless wet etching silicon dioxide post-CMOS process and its applicationDai, C.L.; 戴慶良-
-A MEMS micromirror fabricated using CMOS post-processCheng, Y.C.; 戴慶良; Dai, C.L.; Lee, C.Y.; Chen, P.H.; Chang, P.Z.-
-Micro FET pressure sensor manufactured using CMOS-MEMS techniqueDai, C.L.; 戴慶良; Kao, P.H.; Tai, Y.W.; Wu, C.C.-
-Micro Magnetic Field Sensors Manufactured Using a Standard 0.18-μm CMOS ProcessLin, Yen-Nan; Dai, Ching-Liang; 戴慶良
-Microelectromechanical resonator manufactured using CMOS-MEMS techniqueDai, C.L.; 戴慶良; Kuo, C.H.; Chiang, M.C.-
-A micromachined microwave switch fabricated by the complementary metal oxide semiconductor post-process of etching silicon dioxideDai, C.L.; 戴慶良; Peng, H.J.; Liu, M.C.; Wu, C.C.; Hsu, H.M.; Yang, L.J.-
-A micromachined tunable resonator fabricated by the CMOS post-process of etching silicon dioxideDai, C.L.; 戴慶良; Yu, W.C.-
-Modeling and fabrication of a microelectromechanical microwave switchDai, C.L.; 戴慶良; Hsu, H.M.; Tsai, M.C.; Hsieh, M.M.; Chang, M.W.-
-Modeling and fabrication of micro FET pressure sensor with circuitsDai, C.L.; 戴慶良; Tai, Y.W.; Kao, P.H.-
-Modeling and manufacturing of micromechanical RF switch with inductorsDai, C.L.; 戴慶良; Chen, Y.L.-
-Nanocone SiGe antireflective thin films fabricated by ultrahigh-vacuum chemical vapor deposition with in situ annealingChang, Y.M.; 戴慶良; Dai, C.L.; Cheng, T.C.; Hsu, C.W.-
-A nanowire WO3 humidity sensor integrated with micro-heater and inverting amplifier circuit on chip manufactured using CMOS-MEMS techniqueDai, C.L.; 戴慶良; Liu, M.C.; Chen, F.S.; Wu, C.C.; Chang, M.W.-
-Novel method for in situ monitoring of thickness of quartz during wet etchingLee, C.Y.; 戴慶良; Chang, P.Z.; Chen, Y.Y.; Dai, C.L.; Chen, P.H.; Lee, S.J.-
-Novel method for in-situ monitoring of thickness of silicon wafer during wet etchingLee, C.Y.; 戴慶良; Chang, P.Z.; Chen, Y.Y.; Dai, C.L.; Wang, X.Y.; Chen, P.H.; Lee, S.J.-
-Optical heterodyne laser encoder with sub-nanometer resolutionWu, C.C.; 戴慶良; Hsu, C.C.; Lee, J.Y.; Chen, H.Y.; Dai, C.L.-
-Optical property of an antireflection coating fabricated by an optimal spin-coating method with a pH-modified SiO2 nanoparticle solutionChyan-Chyi Wu; Cheng-Chih Hsu; Yu-Chian Lin; Chia-Wei Chiang; 戴慶良; Ching-Lian Dai
-P-N串聯多晶矽開關及其製造方法戴慶良; DAI, CHING LIANG; 劉茂誠; 陳盈良; LIU, MAO CHEN-