Browsing by Author Chang, L.

Showing results 1 to 4 of 4
Issue DateTitleAuthor(s)Text
-Effects of plasma treatment in the tungsten process for chemical vapor deposition titanium nitride barrier film beyond nanometer technologyChen, K.W.; 李豐穎; Wang, Y.L.; Chang, L.; Li, F.Y.; Hwang, G.J.-
-Electron delocalization of tensily strained GaAs quantum dots in GaSb matrixLin, T.C.; Wu, Y.H.; Li, L.C.; Sung, Y.T.; Lin, S.D.; Chang, L.; Suen, Y.W.; Lee, C.P.-
-Investigation of overpotential and seed thickness on damascene copper electroplatingChen, K.W.; 李豐穎; Wang, Y.L.; Chang, L.; Li, F.Y.; Chang, S.C.-
-Novel slurry solution for dishing elimination in copper process beyond 0.1-mu m technologyChen, K.W.; 李豐穎; Wang, Y.L.; Liu, C.P.; Chang, L.; Li, F.Y.-