Browsing by Author Lu, F.H.


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Issue DateTitleAuthor(s)Text
-Barium titanate films synthesized by an anodic oxidation-based electrochemical methodLu, F.H.; 呂福興; Wu, C.T.; Hung, C.Y.-
-Characterization of Cr-doped TiO2 thin films prepared by cathodic arc plasma depositionChan, M.H.; 呂福興; Ho, W.Y.; Wang, D.Y.; Lu, F.H.-
-Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixturesChan, M.H.; Lu, F.H.-
-Characterization of the microstructure and phase formation in the Au-In system using transmission electron microscopyChang, Z.C.; 呂福興; Lu, F.H.; Shieu, F.S.; 薛富盛-
-Characterization of titanium nitride films deposited by cathodic are plasma technique on copper substratesLu, F.H.; 呂福興; Chen, H.Y.-
-Comparative study of low dielectric constant material deposited using different precursorsWei, B.J.; 呂福興; Cheng, Y.L.; Lu, F.H.; Chiu, T.J.; Shih, H.C.-
-Corrosion and tribological studies of chromium nitride coated on steel with an interlayer of electroplated chromiumHan, S.; 呂福興; Lin, J.H.; Tsai, S.H.; Chung, S.C.; Wang, D.Y.; Lu, F.H.; Shih, H.C.-
-Corrosion resistance of BaTiQ(3) films prepared by plasma electrolytic oxidationWu, C.T.; 呂福興; Lu, F.H.-
-Corrosion resistance of chromium nitride on low alloy steels by cathodic arc depositionHan, S.; 呂福興; Lin, J.H.; Wang, D.Y.; Lu, F.H.; Shih, H.C.-
-Degradation of CrN films at high temperature under controlled atmosphereLu, F.H.; 呂福興; Chen, H.Y.; Hung, C.H.-
-The degradation of TiN films on Cu substrates at high temperature under controlled atmosphereLu, F.H.; 呂福興; Feng, S.P.; Chen, H.Y.; Li, J.K.-
-Degradation of ZrN films at high temperature under controlled atmosphereLu, F.H.; 呂福興; Lo, W.Z.-
-Dielectric properties of high-density-plasma fluorinated-silicate glass by doping nitrogenWei, B.J.; 呂福興; Cheng, Y.L.; Wang, Y.L.; Lu, F.H.; Shih, H.C.-
-The effect of Cr interlayer on the microstructure of CrN coatings on steelHan, S.; 呂福興; Lin, J.H.; Guo, X.J.; Tsai, S.H.; Su, Y.O.; Huang, J.H.; Lu, F.H.; Shih, H.C.-
-Effect of metal vapor vacuum arc Cr-implanted interlayers on the microstructure of CrN film on siliconHan, S.; 呂福興; Chen, H.Y.; Chang, Z.C.; Lin, J.H.; Yang, C.J.; Lu, F.H.; Shieu, F.S.; Shih, H.C.; 薛富盛-
-Effects of addition of Al(NO3)(3) to electrolytes on alumina coatings by plasma electrolytic oxidationHsu, C.H.; Teng, H.P.; Lu, F.H.-
-Effects of MEVVA-implanted chromium on the structure and properties of CrN filmHan, S.; 呂福興; Chen, H.Y.; Chang, K.L.; Weng, K.W.; Wang, D.Y.; Lu, F.H.; Shih, H.C.-
-Epitaxial growth of BaTiO3 films on TiN/Si substrates by a hydrothermal-galvanic couple methodChieh, Y.C.; 呂福興; Yu, C.C.; Lu, F.H.-
-Eutectic reaction between copper oxide and titanium dioxideLu, F.H.; 呂福興; Fang, F.X.; Chen, Y.S.-
-Evaluation of Poisson's ratio and Young's modulus of nitride films by combining grazing incidence X-ray diffraction and laser curvature techniquesChen, H.Y.; 呂福興; Chen, J.H.; Lu, F.H.-