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標題: Characteristics of atomic layer deposition-grown zinc oxide thin film with and without aluminum
作者: Ming-Chun Tseng 
Dong-Sing Wuu 
Chi-Lu Chen 
Hsin-Ying Lee 
Cheng-Yu Chien 
關鍵字: Aluminum-doped zinc oxide;Zinc oxide;Atomic layer deposition
Zinc oxide (ZnO) and Al-doped ZnO (AZO) thin films were deposited on glass substrates using atomic layer deposition. The Al composition of the AZO thin films was varied by controlling the Zn:Al cycle ratios. The ZnO and AZO thin films were characterized using atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction, and optical measurements. The electrical properties of the ZnO and AZO thin films were influenced by the Zn:Al cycle ratios. The resistivity of the AZO thin film decreased significantly, whereas the carrier concentration increased with the Al composition. As the Zn:Al cycle ratio increased, the AZO thin film achieved an average transmittance of >85%.
Appears in Collections:材料科學與工程學系

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