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標題: 鎳鐵/錳奈米多層薄膜之結構及磁性質之研究
The study of Structures and Magnetic Properties of NiFe/Mn Multilayers.
作者: 黃梅如
Huang, Mei-Lu
關鍵字: 雙離子束濺鍍;IBAD;交換偏壓;矯頑磁力;Exchange Bias;Coercivity
出版社: 材料科學與工程學系所
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磁性分析顯示,當外加磁場平行於膜面(In-plane),所測得之矯頑磁場約為0.6 Oe,僅需極小的外加磁場即可達到飽和,而垂直膜面(out-of-plane)即使外加磁場達到2000 Oe仍無法達到飽和,因而得知NiFe之易磁化軸(easy axis)為平行膜面方向,垂直膜面方向則為難磁化軸(hard axis)。單層薄膜結果顯示矯頑磁場約為0.6Oe及飽合磁化量(Ms)約為811.81(ms)emu/cm3。
在場冷20kOe至溫度5K時,其矯頑磁力(Hc)與交換偏壓場(Hex)皆較室溫增加,是因為場冷以及量測溫度低於反鐵磁層之尼爾溫度(TN),所以會有顯著之交換耦合現象。因此磁滯曲線在場冷情況下會往負場偏移。單向異向性(unidirectional anisotropy)的反鐵磁磁矩(Mn)與鐵磁磁矩(NiFe)的交換耦合作用(exchange coupling)導致磁滯曲線往負磁場偏移,是鐵磁與反鐵磁磁矩間界面為鐵磁耦合(FM coupling)與反鐵磁耦合(AFM coupling)的轉變。

In this research, we utilized dual-ion-beam sputtering system to fabricate NiFe(3.2nm)/Mn(4nm) multilayer to the study on the structural properties, as well as the magnetic properties. With a dual-ion-beam sputtering system, an Argon-contained ion beam can be produced by using the Kaufman-type ion source. One can deposite films of interest by bombarding the surface of target materials, and the NiFe/Mn multiple-layer film can be manufactured by altering the deposition sequence. From the results of transmission electron microscopy, the ferromagnetic layer NiFe revealed an f.c.c. structure with a lattice constant of 3.55 Å the anti-ferromagnetic layer Mn showed a b.c.c. structure with a lattice constant of 8.91 Å, and the grain size was 2nm-10nm approximately.
In magnetic properties analysis, the result demonstrated that when an external magnetic field is applied parallel to the film surface (In-plane), the coercitive is around 0.6 Oe. In addition, the saturation can be reached by appling an extremely small applied field. On the other hand, for an external magnetic field that is perpendicular to the film surface (Out-of-plane), the saturation can hardly be reached even by appling a 2000 Oe field. Hence,the easy axis of the film surface is in-plane , and hard axis,is out-of-plane Furthermore,the coercirity(Hc) was around 0.6 Oe, and the saturation magnetization(Ms) was approximately 811.81 (ms) emu/cm^3.
When the sample is field cool at 20kOe to 5K,Hc and exchange bias (Hex) was increased. It was because that field cooling and the measured temperature were lower than the Néel temperature(TN) of anti-ferromagnetic layer, and this would result in an obvious exchange coupling phenomenon. Therefore, under the situation of field cooling, the hytersis curve would shift toward the negative field. This shift of hytersis curve was induced by the exchange coupling effect caused by the interaction of unidirectional anisotropy anti-ferromagnetic domain (Mn) and ferromagnetic domain (NiFe),because of the conversion of interface between anti-ferromagnetic domain and ferromagnetic domain from FM coupling to AFM coupling.
其他識別: U0005-3007201217090000
Appears in Collections:材料科學與工程學系

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